Basic Information

Affiliated programs (koza)

• Graduate School of Engineering, 原子核工学専攻 量子理工学講座, 准教授

Faculty

• Faculty of Engineering

Professional Memberships

• 米国真空学会(American Vaccum Society)
• 日本物理学会
• 応用物理学会

Academic Degree

• 博士（工学）(京都大学)

Academic Resume (Undergraduate School/Majors)

• 京都大学, 工学部電子工学科, 卒業

Language of Instruction

• English

ID,URL

• J-Global ID

  200901098950845463

Website(s) (URL(s))

• http://sakura.nucleng.kyoto-u.ac.jp/index.html

researchmap URL

• https://researchmap.jp/jiro_matsuo

Research

Research Interests

• 先端分析技術
• 表面衝突
• イオンビーム
• material analysis
• surface collision
• ion beam

Research Areas

• Manufacturing technology (mechanical, electrical/electronic, chemical engineering), Electronic devices and equipment

Papers

• Monte Carlo simulation of surface smoothing effect by cluster ions

  Norihisa Hagiwara; Noriaki Toyoda; Jiro Matsuo; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999

  
• Molecular dynamics study of implant and damage formation in low-energy boron cluster ion implantation

  Takaaki Aoki; Jiro Matsuo; Zinetulla Insepov; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999

  
• Formation of complex clusters in Ar/O2 gas cluster beams

  Masahiro Saito; Norihisa Hagiwara; Noriaki Toyoda; Jiro Matsuo; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999

  
• Characterization of damage induced by cluster ion implantation

  Aoki, T.; Matsuo, J.; Takaoka, G.

  Materials Research Society Symposium - Proceedings, Mar. 2001

  
• Secondary ion mass spectrometry with gas cluster ion beams

  Toyoda, N.; Matsuo, J.; Aoki, T.; Chiba, S.; Yamada, I.; Fenner, D.B.; Torti, R.

  Materials Research Society Symposium - Proceedings, Mar. 2001

  
• SIMS 測定のためのプラス α の研究技術

  松尾 二郎

  応用物理, Apr. 2023, Peer-reviewed

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• Generation and evaluation of CO clusters for cluster beams

  karahashi kazuhiro; seki toshio; matsuo jiro; hamaguchi satoshi

  JSAP Annual Meetings Extended Abstracts, 03 Mar. 2014

  
• High aspect (>20) etching with reactive gas cluster injection

  Toshio Seki; Hiroki Yamamoto; Kunihiko Koike; Takaaki Aoki; Jiro Matsuo

  JAPANESE JOURNAL OF APPLIED PHYSICS, Jul. 2022, Peer-reviewed

  
• Photoinduced oxygen transport in cobalt double-perovskite crystal EuBaCo2O5.39

  Masaki Hada; Satoshi Ohmura; Tadahiko Ishikawa; Masaki Saigo; Naoya Keio; Wataru Yajima; Tatsuya Suzuki; Daisuke Urushihara; Kou Takubo; Yusuke Masaki; Makoto Kuwahara; Kenji Tsuruta; Yasuhiko Hayashi; Jiro Matsuo; Takayoshi Yokoya; Ken Onda; Fuyuki Shimojo; Muneaki Hase; Sumio Ishihara; Toru Asaka; Nobuyuki Abe; Taka-hisa Arima; Shin-ya Koshihara; Yoichi Okimoto

  APPLIED MATERIALS TODAY, Sep. 2021, Peer-reviewed

  
• Evaluation of damage depth on arginine films with molecular depth profiling by Ar cluster ion beam

  Yamamoto Yasuyuki; Ichiki Kazuya; Seki Toshio; Aoki Takaaki; Matsuo Jiro

  Trans. Mat. Res. Soc. Japan, 2011

  
• Investigation of semiconductor surfaces using soft-X-ray photoelectron spectroscopy.

  MATSUO Jiro; SATO Akira; NAKAYAMA Noriaki

  J. Surf. Sci. Soc. Jpn., 1991

  
• Effects on CO Oxidation Activity of Nano-Scale Au Islands and TiO2 Support Prepared by the Ionized Cluster Beam Method

  Fukushima Kazunori; Takaoka Gikan; Matsuo Jiro; Yamada Isao

  Jpn J Appl Phys, 15 Feb. 1997

  
• Study of the Etching Reaction by Atomic Chlorine Using Molecular Beam Scattering

  Karahashi Kazuhiro; Matsuo Jiro; Horiuchi Kei

  Jpn J Appl Phys, 30 Apr. 1994

  
• Study on Chlorine Adsorbed Silicon Surface Using Soft-X-Ray Photoemission Spectroscopy

  Matsuo Jiro; Karahashi Kazuhiro; Sato Akira; Hijiya Shinpei

  Jpn J Appl Phys, 20 Jun. 1992

  
• Chemical States of Bromine Atoms on SiO2 Surface after HBr Reactive Ion Etching: Analysis of Thin Oxide

  Koshino Keiji; Matsuo Jiro; Nakamura Moritaka

  Jpn J Appl Phys, 20 Jun. 1993

  
• Observation of Liquid Water with Ambient SIMS

  Kusakari M.; Fujii M.; Seki T.; Aoki T.; Matsuo J.

  Transactions of the Materials Research Society of Japan, 2016

  
• Low Vacuum SIMS Measurements of Higher Alcohols with MeV-energy Heavy Ion Beam

  Kusakari Masakazu; Fujii Makiko; Seki Toshio; Aoki Takaaki; Matsuo Jiro

  Trans. Mat. Res. Soc. Japan, 2014

  
• Phonon transport probed at carbon nanotube yarn/sheet boundaries by ultrafast structural dynamics

  Masaki Hada; Kotaro Makino; Hirotaka Inoue; Taisuke Hasegawa; Hideki Masuda; Hiroo Suzuki; Keiichi Shirasu; Tomohiro Nakagawa; Toshio Seki; Jiro Matsuo; Takeshi Nishikawa; Yoshifumi Yamashita; Shin-ya Koshihara; Vlad Stolojan; S. Ravi P. Silva; Jun-ichi Fujita; Yasuhiko Hayashi; Satoshi Maeda; Muneaki Hase

  CARBON, Dec. 2020, Peer-reviewed

  
• MeV-SIMS measurement of lithium-containing electrolyte

  Toshio Seki; Tomoya Nonomura; Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Sep. 2020, Peer-reviewed

  
• Secondary ion mass spectrometry measurements under ambient and humid conditions using MeV ions

  Toshio Seki; Kenta Ishii; Takaaki Aoki; Jiro Matsuo

  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, May 2020, Peer-reviewed

  
• Optimized Alkali-Metal Cationization in Secondary Ion Mass Spectrometry of Polyethylene Glycol Oligomers with up to m/z 10000: Dependence on Cation Species and Concentration

  Hubert Gnaser; Rika Oki; Takaaki Aoki; Toshio Seki; Jiro Matsuo

  ANALYTICAL CHEMISTRY, Jan. 2020, Peer-reviewed

  
• Effect of ramping up rate on end of range defect in multielement molecular-ion (CH3O)-implanted silicon wafers

  Ryo Hirose; Ayumi Onaka-Masada; Ryosuke Okuyama; Takeshi Kadono; Satoshi Shigematsu; Kouji Kobayashi; Akihiro Suzuki; Yoshihiro Koga; Jiro Matsuo; Kazunari Kurita

  JAPANESE JOURNAL OF APPLIED PHYSICS, Dec. 2019, Peer-reviewed

  
• Selective Reduction Mechanism of Graphene Oxide Driven by the Photon Mode versus the Thermal Mode.

  Masaki Hada; Kiyoshi Miyata; Satoshi Ohmura; Yusuke Arashida; Kohei Ichiyanagi; Ikufumi Katayama; Takayuki Suzuki; Wang Chen; Shota Mizote; Takayoshi Sawa; Takayoshi Yokoya; Toshio Seki; Jiro Matsuo; Tomoharu Tokunaga; Chihiro Itoh; Kenji Tsuruta; Ryo Fukaya; Shunsuke Nozawa; Shin-Ichi Adachi; Jun Takeda; Ken Onda; Shin-Ya Koshihara; Yasuhiko Hayashi; Yuta Nishina

  ACS nano, 24 Sep. 2019, Peer-reviewed

  
• Gas cooling secondary ions emitted by gas cluster ion beam at the travelling wave ion guide of a Q-ToF-SIMS system

  P. Thopan; T. Seki; L. D. Yu; U. Tippawan; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jul. 2019, Peer-reviewed

  
• Cluster ion beam bombardment and Q-ToF-SIMS analysis of large biomolecules

  P. Thopan; T. Seki; L. D. Yu; U. Tippawan; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 2019, Peer-reviewed

  
• In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment

  Hubert Gnaser; Wolfgang Bock; Jiro Matsuo

  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, May 2018, Peer-reviewed

  
• In situ cationization of molecular ions sputtered from organic specimens under cluster bombardment

  Hubert Gnaser; Wolfgang Bock; Jiro Matsuo

  Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 01 May 2018, Peer-reviewed

  
• Analysis of Organic Materials with SIMS Using New Probe Ions

  瀬木 利夫; 青木 学聡; 松尾 二郎

  電気学会研究会資料. OQD = The papers of technical meeting on optical and quantum devices, IEE Japan, 28 Mar. 2018

  
• 大気圧SIMS法による固液界面の観察

  松尾 二郎

  表面科学学術講演会要旨集, Jan. 2018

  
• Cationization and fragmentation of molecular ions sputtered from polyethylene glycol under gas cluster bombardment: An analysis by MS and MS/MS

  Thopan, Prutchayawoot; Gnaser, Hubert; Oki, Rika; Aoki, Takaaki; Seki, Toshio; Matsuo, Jiro

  International Journal of Mass Spectrometry, 2018, Peer-reviewed

  
• Recent Progress of SIMS Technique : from Novel Primary Beams to Advanced Mass Spectrometers

  MATSUO Jiro; SEKI Toshio; AOKI Takaaki

  Vacuum and Surface Science, 2018

  
• Molecular imaging of alkaloids in khat (Catha edulis) leaves with MeV-SIMS

  Bostjan Jencic; Luka Jeromel; Nina Ogrinc Potocnik; Katarina Vogel-Mikus; Primoz Vavpetic; Zdravko Rupnik; Klemen Bucar; Matjaz Vencelj; Mitja Kelemen; Jiro Matsuo; Masakazu Kusakari; Zdravko Siketic; Muhammad A. Al-Jalali; Abdallah Shaltout; Primoz Pelicon

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Aug. 2017, Peer-reviewed

  
• Angled etching of Si by ClF3-Ar gas cluster injection

  Seki, Toshio; Yamamoto, Hiroki; Kozawa, Takahiro; Shojo, Tadashi; Koike, Kunihiko; Aoki, Takaaki; Matsuo, Jiro

  JAPANESE JOURNAL OF APPLIED PHYSICS, Jun. 2017, Peer-reviewed

  
• 巻頭言：「イオン化」特集号に寄せて

  松尾 二郎

  質量分析, Jan. 2017

  
• 時間分解電子線回折法を用いたEuBaCo₂O_5.38の構造ダイナミクス計測

  羽田 真毅; 鈴木 達也; 阿部 伸行; 有馬 孝尚; 沖本 洋一; 腰原 伸也; 慶尾 直哉; 村上 寛虎; 西川 亘; 山下 善文; 林 靖彦; 横谷 尚睦; 松尾 二郎; 浅香 透

  日本物理学会講演概要集, Jan. 2017

  
• Fabrication of a Si lever structure made by double-angled etching with reactive gas cluster injection

  Seki, T.; Yamamoto, H.; Kozawa, T.; Koike, K.; Aoki, T.; Matsuo, J.

  Applied Physics Letters, 2017, Peer-reviewed

  
• Molecular dynamics simulations study of nano particle migration by cluster impact

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  Surface and Coatings Technology, Nov. 2016, Peer-reviewed

  
• Effects of molecular weight and cationization agent on the sensitivity of Bi cluster secondary ion mass spectrometry

  Makiko Fujii; Rie Shishido; Takaya Satoh; Shigeru Suzuki; Jiro Matsuo

  RAPID COMMUNICATIONS IN MASS SPECTROMETRY, Jul. 2016, Peer-reviewed

  
• Solvent-free silver-nanoparticle surface-assisted laser desorption/ionization imaging mass spectrometry of the Irganox 1010 coated on polystyrene

  Takaya Satoh; Hironobu Niimi; Naoki Kikuchi; Makiko Fujii; Toshio Seki; Jiro Matsuo

  INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, Jun. 2016, Peer-reviewed

  
• Reactive etching by ClF3–Ar neutral cluster beam with scanning

  Toshio Seki; Yu Yoshino; Takehiko Senoo; Kunihiko Koike; Takaaki Aoki; Jiro Matsuo

  Japanese Journal of Applied Physics, 09 May 2016, Peer-reviewed

  
• Reactive etching by ClF

  Seki Toshio; Yoshino Yu; Senoo Takehiko; Koike Kunihiko; Aoki Takaaki; Matsuo Jiro

  Jpn. J. Appl. Phys., 09 May 2016

  
• Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment

  Hubert Gnaser; Masakazu Kusakari; Makiko Fujii; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 01 May 2016, Peer-reviewed

  
• Development of ambient SIMS using mega-electron-volt-energy ion probe

  Kusakari, Masakazu; Fujii, Makiko; Seki, Toshio; Aoki, Takaaki; Matsuo, Jiro

  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, May 2016, Peer-reviewed

  
• Peptide Fragmentation and Surface Structural Analysis by Means of ToF-SIMS Using Large Cluster Ion Sources

  Yuta Yokoyama; Satoka Aoyagi; Makiko Fujii; Jiro Matsuo; John S. Fletcher; Nicholas P. Lockyer; John C. Vickerman; Melissa K. Passarelli; Rasmus Havelund; Martin P. Seah

  ANALYTICAL CHEMISTRY, Apr. 2016, Peer-reviewed

  
• Recent Progress in Cluster Beam Technique

  MATSUO Jiro; FUJII Makiko; SEKI Toshio; AOKI Takaaki

  Journal of the Japan Society for Precision Engineering, Jan. 2016

  
• クラスターイオンビーム技術の最近の進展—ナノ加工からバイオ材料評価まで—

  松尾 二郎; 藤井 麻樹子; 瀬木 利夫; 青木 学聡

  Journal of the Vacuum Society of Japan, Jan. 2016

  
• Laser Desorption Ionization Imaging Mass Spectrometry for Surface Analysis

  Satoh Takaya; Fujii Makiko; Matsuo Jiro

  Journal of Surface Analysis, Jan. 2016

  
• Cluster SIMS: Current Status and Future Prospects

  MATSUO JIRO

  Abstract of annual meeting of the Surface Science of Japan, Jan. 2016

  
• Yields and images of secondary ions from organic materials by different primary Bi ions in time-of-flight secondary ion mass spectrometry

  Shishido, R.; Fujii, M.; Seki, T.; Aoki, T.; Matsuo, J.; Suzuki, S.

  Rapid Communications in Mass Spectrometry, 2016, Peer-reviewed

  
• Ambient analysis of liquid materials with Wet-SIMS

  Seki, T.; Kusakari, M.; Fujii, M.; Aoki, T.; Matsuo, J.

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 2016, Peer-reviewed

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• Development of ambient SIMS using mega-electron-volt-energy ion probe

  Masakazu Kusakari; Makiko Fujii; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2016, Peer-reviewed

  
• Secondary ion emission from leucine and isoleucine under argon gas-cluster ion bombardment

  Gnaser, H.; Kusakari, M.; Fujii, M.; Seki, T.; Aoki, T.; Matsuo, J.

  Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics, 2016, Peer-reviewed

  
• Development of Low-vacuum SIMS instruments with large cluster Ion beam

  Suzuki, K.; Kusakari, M.; Fujii, M.; Seki, T.; Aoki, T.; Matsuo, J.

  Surface and Interface Analysis, 2016, Peer-reviewed

  
• High-aspect-ratio patterning by ClF3-Ar neutral cluster etching

  Hiroki Yamamoto; Toshio Seki; Jiro Matsuo; Kunihiko Koike; Takahiro Kozawa

  MICROELECTRONIC ENGINEERING, Jun. 2015, Peer-reviewed

  
• Molecular cluster emission in sputtering of amino acids by argon gas-cluster ions

  Masakazu Kusakari; Hubert Gnaser; Makiko Fujii; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, May 2015, Peer-reviewed

  
• Progress and applications of cluster ion beam technology

  I. Yamada; J. Matsuo; N. Toyoda; T. Aoki; T. Seki

  CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, Feb. 2015, Peer-reviewed

  
• Mass analysis by Ar-GCIB-dynamic SIMS for organic materials

  Masato Suzuki; Masashi Nojima; Makiko Fujii; Toshio Seki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Feb. 2015, Peer-reviewed

  
• Mass analysis by Ar-GCIB-dynamic SIMS for organic materials (Retracted article. See vol. 48, pg. 383, 2016)

  Masato Suzuki; Masashi Nojima; Makiko Fujii; Toshio Seki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Feb. 2015, Peer-reviewed

  
• Recent Progress and Future Prospect of Cluster SIMS for Biological Applications

  FUJII MAKIKO; SEKI TOSHIO; AOKI TAKAAKI; MATSUO JIRO

  Abstract of annual meeting of the Surface Science of Japan, Jan. 2015

  
• Imaging Mass of Bio-molecules with cluster SIMS

  Matsuo Jiro; Suzuki Kanji; Kusakari Masakazu; Fujii Makiko; Aoki Takaaki; Seki Toshio

  Abstract of annual meeting of the Surface Science of Japan, Jan. 2015

  
• Study on imaging analysis of organic materials with Bi cluster TOF-SIMS

  Shishido Rie; Fujii Makiko; Seki Toshio; Aoki Takaaki; Matsuo Jiro; Suzuki Shigeru

  Abstract of annual meeting of the Surface Science of Japan, Jan. 2015

  
• Mass analysis by Ar-GCIB-dynamic SIMS for organic materials

  Masato Suzuki; Masashi Nojima; Makiko Fujii; Toshio Seki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Dec. 2014, Peer-reviewed

  
• Analysis of liquid materials in low vacuum with Wet-SIMS

  Toshio Seki; Makiko Fujii; Masakazu Kusakari; Shunichiro Nakagawa; Takaaki Aoki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Dec. 2014, Peer-reviewed

  
• Quantitative analysis of lipids with argon gas cluster ion beam secondary ion mass spectrometry

  Makiko Fujii; Shunichirou Nakagawa; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Dec. 2014, Peer-reviewed

  
• Lipid compounds analysis with MeV-SIMS apparatus for biological applications

  Makiko Fujii; Masakazu Kusakari; Kazuhiro Matsuda; Naoki Man; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Nov. 2014, Peer-reviewed

  
• Development of organic SIMS system with Ar-GCIB and IMS-4f

  Masashi Nojima; Masato Suzuki; Makiko Fujii; Toshio Seki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Nov. 2014, Peer-reviewed

  
• Development of a TOF SIMS setup at the Zagreb heavy ion microbeam facility

  Tonci Tadic; Iva Bogdanovic Radovic; Zdravko Siketic; Donny Domagoj Cosic; Natko Skukan; Milko Jaksic; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Aug. 2014, Peer-reviewed

  
• Biomaterial imaging with MeV-energy heavy ion beams

  Toshio Seki; Yoshinobu Wakamatsu; Shunichiro Nakagawa; Takaaki Aoki; Akihiko Ishihara; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Aug. 2014, Peer-reviewed

  
• Development of Au-GCIB dynamic SIMS and cluster size filtering system

  M. Nojima; M. Suzuki; T. Adachi; S. Hotta; M. Fujii; T. Seki; J. Matsuo

  Microscopy and Microanalysis, 01 Aug. 2014, Peer-reviewed

  
• Novel SIMS system with focused massive cluster ion source for mass imaging spectrometry with high lateral resolution

  Jiro Matsuo; Souta Torii; Kazuki Yamauchi; Keisuke Wakamoto; Masakazu Kusakari; Shunichiro Nakagawa; Makiko Fujii; Takaaki Aoki; Toshio Seki

  APPLIED PHYSICS EXPRESS, May 2014, Peer-reviewed

  
• Cold ablation driven by localized forces in alkali halides

  Masaki Hada; Dongfang Zhang; Kostyantyn Pichugin; Julian Hirscht; Micha A. Kochman; Stuart A. Hayes; Stephanie Manz; Regis Y. N. Gengler; Derek A. Wann; Toshio Seki; Gustavo Moriena; Carole A. Morrison; Jiro Matsuo; German Sciaini; R. J. Dwayne Miller

  NATURE COMMUNICATIONS, May 2014, Peer-reviewed

  
• Study on the detection limits of a new argon gas cluster ion beam secondary ion mass spectrometry apparatus using lipid compound samples

  Makiko Fujii; Shunichirou Nakagawa; Kazuhiro Matsuda; Naoki Man; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  RAPID COMMUNICATIONS IN MASS SPECTROMETRY, Apr. 2014, Peer-reviewed

  
• Prolific cluster emission in sputtering of phenylalanine by argon-cluster ion bombardment

  Hubert Gnaser; Makiko Fujii; Shunichirou Nakagawa; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, Mar. 2014, Peer-reviewed

  
• Recent progress in surface analysis technique with cluster ion beams

  松尾 二郎

  応用物理, Jan. 2014

  
• クラスターSIMS法による脂質分子の高感度検出とイメージングへの応用

  藤井 麻樹子; 宍戸 理恵; 鳥居 聡太; 中川 駿一郎; 瀬木 利夫; 青木 学聡; 鈴木 茂; 松尾 二郎

  表面科学, Jan. 2014

  
• An electrostatic quadrupole doublet focusing system for MeV heavy ions in MeV-SIMS

  T. Seki; S. Shitomoto; S. Nakagawa; T. Aoki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Nov. 2013, Peer-reviewed

  
• Molecular dynamics simulation study of damage formation and sputtering with huge fluorine cluster impact on silicon

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 2013, Peer-reviewed

  
• Ion-induced damage evaluation with Ar cluster ion beams

  Yasuyuki Yamamoto; Kazuya Ichiki; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Jan. 2013, Peer-reviewed

  
• Development of gas cluster ion beam irradiation system with an orthogonal acceleration TOF instrument

  K. Ichiki; J. Tamura; T. Seki; T. Aoki; J. Matsuo

  SURFACE AND INTERFACE ANALYSIS, Jan. 2013, Peer-reviewed

  
• Sputtered ion emission under size-selected Arn+ cluster ion bombardment

  Hubert Gnaser; Kazuya Ichiki; Jiro Matsuo

  Surface and Interface Analysis, Jan. 2013, Peer-reviewed

  
• Peptide dissociation patterns in secondary ion mass spectrometry under large argon cluster ion bombardment

  Hubert Gnaser; Makiko Fujii; Shunichirou Nakagawa; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Rapid Communications in Mass Spectrometry, 2013, Peer-reviewed

  
• Ultrafine particle removal using gas cluster ion beam technology

  Kazuya Dobashi; Kensuke Inai; Misako Saito; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  IEEE Transactions on Semiconductor Manufacturing, 2013, Peer-reviewed

  
• Removal of Ion implanted Poly vinyl phenol using Wet Ozone

  Yousuke Goto; Yukihiro Angata; Masashi Yamamoto; Toshio Seki; Jiro Matsumoto; Hideo Horibe

  JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2013, Peer-reviewed

  
• Hot electron injection driven phase transitions

  Masaki Hada; Dongfang Zhang; Albert Casandruc; R. J. Dwayne Miller; Yusaku Hontani; Jiro Matsuo; Robert E. Marvel; Richard F. Haglund

  Physical Review B - Condensed Matter and Materials Physics, 01 Oct. 2012, Peer-reviewed

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• Hot electron injection driven phase transitions

  Masaki Hada; Dongfang Zhang; Albert Casandruc; R. J. Dwayne Miller; Yusaku Hontani; Jiro Matsuo; Robert E. Marvel; Richard F. Haglund

  PHYSICAL REVIEW B, Oct. 2012, Peer-reviewed

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• Ultrafast X-ray sources for time-resolved measurements

  Masaki Hada; Jiro Matsuo

  X-RAY SPECTROMETRY, Jul. 2012, Peer-reviewed

  
• Molecular dynamics study of crater formation by core-shell structured cluster impact

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jul. 2012, Peer-reviewed

  
• Depth profiling analysis of damaged arginine films with Ar cluster ion beams

  J. Matsuo; K. Ichiki; Y. Yamamoto; T. Seki; T. Aoki

  SURFACE AND INTERFACE ANALYSIS, Jun. 2012, Peer-reviewed

  
• Femtosecond electron diffraction: Preparation and characterization of (110)-oriented bismuth films

  Gustavo Moriena; Masaki Hada; German Sciaini; Jiro Matsuo; R. J. Dwayne Miller

  JOURNAL OF APPLIED PHYSICS, Feb. 2012, Peer-reviewed

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• Strongly reduced fragmentation and soft emission processes in sputtered ion formation from amino acid films under large Ar-n(+) (n <= 2200) cluster ion bombardment

  Hubert Gnaser; Kazuya Ichiki; Jiro Matsuo

  RAPID COMMUNICATIONS IN MASS SPECTROMETRY, Jan. 2012, Peer-reviewed

  
• Low-damage milling of an amino acid thin film with cluster ion beam

  Masaki Hada; Sachi Ibuki; Yusaku Hontani; Yasuyuki Yamamoto; Kazuya Ichiki; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  JOURNAL OF APPLIED PHYSICS, Nov. 2011, Peer-reviewed

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• Etching of metallic materials with Cl-2 gas cluster ion beam

  T. Seki; T. Aoki; J. Matsuo

  SURFACE & COATINGS TECHNOLOGY, Nov. 2011, Peer-reviewed

  
• Highly sensitive molecular detection with swift heavy ions

  Yoshinobu Wakamatsu; Hideaki Yamada; Satoshi Ninomiya; Brian N. Jones; Toshio Seki; Takaaki Aoki; Roger Webb; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Oct. 2011, Peer-reviewed

  
• The effects of cluster size on sputtering and surface smoothing of PMMA with gas cluster ion beams

  Kazuya Ichiki; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Transactions of the Materials Research Society of Japan, Sep. 2011, Peer-reviewed

  
• Photo-induced lattice softening of excited-state VO2

  Masaki Hada; Kunio Okimura; Jiro Matsuo

  APPLIED PHYSICS LETTERS, Aug. 2011, Peer-reviewed

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• Molecular dynamics simulations of large fluorine cluster impact on silicon with supersonic velocity

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jul. 2011, Peer-reviewed

  
• The effect of incident energy on molecular depth profiling of polymers with large Ar cluster ion beams

  Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Jan. 2011, Peer-reviewed

  
• Analysis of organic semiconductor multilayers with Ar cluster secondary ion mass spectrometry

  Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Jan. 2011, Peer-reviewed

  
• Characterization of vapor-deposited L-leucine nanofilm

  Masaki Hada; Kazuya Ichiki; Jiro Matsuo

  THIN SOLID FILMS, Jan. 2011, Peer-reviewed

  
• Comparison of MeV monomer ion and keV cluster ToF-SIMS

  Brian N. Jones; Jiro Matsuo; Yoshihiko Nakata; Hideaki Yamada; John Watts; Steven Hinder; Vladimir Palitsin; Roger Webb

  SURFACE AND INTERFACE ANALYSIS, Jan. 2011, Peer-reviewed

  
• Surface morphology of PMMA surfaces bombarded with size-selected gas cluster ion beams

  K. Ichiki; S. Ninomiya; Y. Nakata; H. Yamada; T. Seki; T. Aoki; J. Matsuo

  SURFACE AND INTERFACE ANALYSIS, Jan. 2011, Peer-reviewed

  
• MeV-energy probe SIMS imaging of major components in washed and fractured animal cells

  H. Yamada; Y. Nakata; S. Ninomiya; T. Seki; T. Aoki; J. Tamura; J. Matsuo

  SURFACE AND INTERFACE ANALYSIS, Jan. 2011, Peer-reviewed

  
• Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams

  Masaki Hada; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  SURFACE AND INTERFACE ANALYSIS, Jan. 2011, Peer-reviewed

  
• Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer

  Masaki Hada; Jiro Matsuo

  BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 2011, Peer-reviewed

  
• Simultaneous Sterilization With Surface Modification Of Plastic Bottle By Plasma-Based Ion Implantation

  N. Sakudo; N. Ikenaga; F. Ikeda; Y. Nakayama; Y. Kishi; Z. Yajima; Jiro Matsuo; Masataka Kase; Takaaki Aoki; Toshio Seki

  2011

  
• Processing Techniques of Biomaterials: Using Gas Cluster Ion Beam for Imaging Mass Spectrometry

  H Yamada; K Ichiki; Y Nakata; S Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Transactions of the Materials Research Society of Japan, Dec. 2010, Peer-reviewed

  
• SIMS Depth Profiling of Organic Materials with Ar Cluster Ion Beam

  Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Transactions of the Materials Research Society of Japan, Dec. 2010, Peer-reviewed

  
• Sputtering Properties of Si by Size-Selected Ar Gas Cluster Ion Beam

  K Ichiki; S Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Transactions of the Materials Research Society of Japan, Dec. 2010, Peer-reviewed

  
• Nano processing with gas cluster ion beams

  Jiro Matsuo; Teruyuki Kitagawa; Toshio Seki; Takaaki Aoki

  Toraibarojisuto/Journal of Japanese Society of Tribologists, 01 Dec. 2010

  
• Anisotropic etching using reactive cluster beams

  Kunihiko Koike; Yu Yoshino; Takehiko Senoo; Toshio Seki; Satoshi Ninomiya; Takaaki Aoki; Jiro Matsuo

  Applied Physics Express, Dec. 2010, Peer-reviewed

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• Nano Processing with Gas Cluster Ion Beams

  MATSUO Jiro; KITAGAWA Teruyuki; SEKI Toshio; AOKI Takaaki

  Journal of Japanese Society of Tribologists, 15 Nov. 2010, Peer-reviewed

  
• Characterization of structural dynamics of VO2 thin film on c-Al2O3 using in-air time-resolved x-ray diffraction

  Masaki Hada; Kunio Okimura; Jiro Matsuo

  PHYSICAL REVIEW B, Oct. 2010, Peer-reviewed

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• SIMS with highly excited primary beams for molecular depth profiling and imaging of organic and biological materials

  Jiro Matsuo; Satoshi Ninomiya; Hideaki Yamada; Kazuya Ichiki; Yoshinobu Wakamatsu; Masaki Hada; Toshio Seki; Takaaki Aoki

  SURFACE AND INTERFACE ANALYSIS, Oct. 2010, Peer-reviewed

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• MeV-energy probe SIMS imaging of major components in animal cells etched using large gas cluster ions

  Hideaki Yamada; Kazuya Ichiki; Yoshihiko Nakata; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 2010, Peer-reviewed

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• 高密度励起ビームによる二次イオン質量分析法の有機・生体材料への新展開

  松尾 二郎

  應用物理, Apr. 2010, Peer-reviewed

  
• Effects of ambient pressure on Cu K alpha X-ray radiation with millijoule and high-repetition-rate femtosecond laser

  M. Hada; J. Matsuo

  APPLIED PHYSICS B-LASERS AND OPTICS, Apr. 2010, Peer-reviewed

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• Molecular dynamics simulations for gas cluster ion beam processes

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  VACUUM, Mar. 2010, Peer-reviewed

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• Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions

  J. L. S. Lee; S. Ninomiya; J. Matsuo; I. S. Gilmore; M. P. Seah; A. G. Shard

  ANALYTICAL CHEMISTRY, Jan. 2010, Peer-reviewed

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• Evaluation of Damage Layer in an Organic Film with Irradiation of Energetic Ion Beams

  Masaki Hada; Sachi Ibuki; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, Peer-reviewed

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• Development of Ultrafast Pulse X-ray Source in Ambient Pressure with a Millijoule High Repetition Rate Femtosecond Laser

  Masaki Hada; Jiro Matsuo

  Green Energy and Technology, 2010, Peer-reviewed

  
• Luminescence studies of residual damage in low-dose arsenic implanted silicon after high-temperature annealing

  Akihiko Sagara; Miori Hiraiwa; Satoshi Shibata; Ryuichi Sugie; Keiichi Yamada

  AIP Conference Proceedings, 2010, Peer-reviewed

  
• Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams

  Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  RAPID COMMUNICATIONS IN MASS SPECTROMETRY, Oct. 2009, Peer-reviewed

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• Study of density effect of large gas cluster impact by molecular dynamics simulations

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Sep. 2009, Peer-reviewed

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• The emission process of secondary ions from solids bombarded with large gas cluster ions

  Satoshi Ninomiya; Kazuya Ichiki; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Aug. 2009, Peer-reviewed

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• Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams

  Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  RAPID COMMUNICATIONS IN MASS SPECTROMETRY, Jun. 2009, Peer-reviewed

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• Imaging mass spectrometry with nuclear microprobes for biological applications

  Y. Nakata; H. Yamada; Y. Honda; S. Ninomiya; T. Seki; T. Aoki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 2009, Peer-reviewed

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• Study of crater formation and sputtering process with large gas cluster impact by molecular dynamics simulations

  Takaaki Aoki; Toshio Seki; Satoshi Ninomiya; Kazuya Ichiki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 2009, Peer-reviewed

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• High-speed processing with Cl-2 cluster ion beam

  T. Seki; T. Aoki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 2009, Peer-reviewed

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• Low Damage Etching of Polymer Materials for Depth Profile Analysis Using Large Ar Cluster Ion Beam

  Satoshi Ninomiya; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Journal of Surface Analysis, Feb. 2009, Peer-reviewed

  
• Matrix-free high-resolution imaging mass spectrometry with high-energy ion projectiles

  Yoshihiko Nakata; Yoshiro Honda; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  JOURNAL OF MASS SPECTROMETRY, Jan. 2009, Peer-reviewed

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• A Processing Technique for Cell Surfaces Using Gas Cluster Ions for Imaging Mass Spectrometry

  Hideaki Yamada; Kazuya Ichiki; Yoshihiko Nakata; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Journal of the Mass Spectrometry Society of Japan, Jan. 2009, Peer-reviewed

  
• Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations

  Takaaki Aoki; Jiro Matsuo

  Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 2009, Peer-reviewed

  
• Stress measurement of carbon cluster implanted layers with in-plane diffraction technique

  Jiro Matsuo; Kazuya Ichiki; Masaki Hada; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Tsutomu Nagayama; Masayasu Tanjyo

  Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 2009, Peer-reviewed

  
• What size of cluster is most appropriate for SIMS?

  Jiro Matsuo; Satoshi Ninomiya; Yoshihiko Nakata; Yoshiro Honda; Kazuya Ichiki; Toshio Seki; Takaaki Aoki

  APPLIED SURFACE SCIENCE, Dec. 2008, Peer-reviewed

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• Low Damage Etching and SIMS Depth Profiling with Large Ar Cluster Ions

  Satoshi Ninomiya; Jiro Matsuo; Kazuya Ichiki; Hideaki Yamada; Yoshihiko Nakata; Yoshiro Honda; Toshio Seki; Takaaki Aoki

  Transactions of the MRS-J, Dec. 2008, Peer-reviewed

  
• High-Speed Nano-Processing with Cluster Ion Beams

  Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Transactions of the MRS-J, Dec. 2008, Peer-reviewed

  
• A fragment-free ionization technique for organic mass spectrometry with large Ar cluster ions

  Satoshi Ninomiya; Yoshihiko Nakata; Yoshiro Honda; Kazuya Ichiki; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  APPLIED SURFACE SCIENCE, Dec. 2008, Peer-reviewed

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• Yield enhancement of molecular ions with MeV ion-induced electronic excitation

  Y. Nakata; Y. Honda; S. Ninomiya; T. Seki; T. Aoki; J. Matsuo

  APPLIED SURFACE SCIENCE, Dec. 2008, Peer-reviewed

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• SIMS Analysis of Biological Mixtures with Fast Heavy Ion Irradiation

  Yoshiro Honda; Yoshihiko Nakata; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Transactions of the MRS-J, Dec. 2008, Peer-reviewed

  
• High sputtering yields of organic compounds by large gas cluster ions

  K. Ichiki; S. Ninomiya; Y. Nakata; Y. Honda; T. Seki; T. Aoki; J. Matsuo

  APPLIED SURFACE SCIENCE, Dec. 2008, Peer-reviewed

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• MD simulation study of the sputtering process by high-energy gas cluster impact

  Takaaki Aoki; Toshio Seki; Satoshi Ninomiya; Jiro Matsuo

  APPLIED SURFACE SCIENCE, Dec. 2008, Peer-reviewed

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• Secondary ion emission from Si bombarded with large Ar cluster ions under UHV conditions

  Satoshi Ninomiya; Kazuya Ichiki; Yoshihiko Nakata; Yoshiro Honda; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  APPLIED SURFACE SCIENCE, Dec. 2008, Peer-reviewed

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• Carbon nanotubes from a divided catalyst: the carbon transmission method

  Takeshi Hikata; Kazuhiko Hayashi; Tomoyuki Mizukoshi; Yoshiaki Sakurai; Itsuo Ishigami; Takaaki Aoki; Toshio Seki; Jiro Matsuo

  APPLIED PHYSICS EXPRESS, Mar. 2008, Peer-reviewed

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• Summary of Industry-Academia Collaboration Projects on Cluster Ion Beam Process Technology

  Yamada Isao; Matsuo Jiro; Toyoda Noriaki

  ION IMPLANTATION TECHNOLOGY 2008, 2008, Peer-reviewed

  
• Low damage smoothing of magnetic materials using off-nonnal gas cluster ion beam irradiation

  S. Kakuta; S. Sasaki; K. Furusawa; T. Seki; T. Aoki; J. Matsuo

  SURFACE & COATINGS TECHNOLOGY, Aug. 2007, Peer-reviewed

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• Molecular dynamics study of monomer and dimer emission processes with high energy gas cluster ion impact

  Takaaki Aoki; Toshio Seki; Satoshi Ninomiya; Jiro Matsuo

  SURFACE & COATINGS TECHNOLOGY, Aug. 2007, Peer-reviewed

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• Molecular dynamics study of glancing angle gas cluster irradiation on irregular-structured surfaces

  Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Aug. 2007, Peer-reviewed

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• Energy distribution of high-energy cluster ion beams

  T. Seki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Aug. 2007

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• Surface processing with high-energy gas cluster ion beams

  Toshio Seki; Jiro Matsuo

  SURFACE & COATINGS TECHNOLOGY, Aug. 2007

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• High-speed processing with high-energy SF6 cluster ion beam

  T. Seki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2007

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• Effect of oblique irradiation of gas cluster ion beam on surface properties of gold mirrors

  A. Suzuki; E. Bourelle; A. Sato; T. Seki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2007

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• Low-damage surface smoothing of laser crystallized polycrystalline silicon using gas cluster ion beam

  H. Tokioka; H. Yamarin; T. Fujino; M. Inoue; T. Seki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2007

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• Molecular dynamics simulations of surface smoothing and sputtering process with glancing-angle gas cluster ion beams

  Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2007, Peer-reviewed

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• Low damage smoothing of magnetic material films using a gas cluster ion beam

  S. Kakuta; S. Sasaki; T. Hirano; K. Ueda; T. Seki; S. Ninomiya; M. Hada; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2007

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• Size effect in cluster collision on solid surfaces

  Jiro Matsuo; Satoshi Ninomiya; Yoshihiko Nakata; Kazuya Ichiki; Takaaki Aoki; Toshio Seki

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2007, Peer-reviewed

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• Secondary ion emission from bio-molecular thin films under ion bombardment

  Yoshihiko Nakata; Satoshi Ninomiya; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Mar. 2007

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• Measurements of secondary ions emitted from organic compounds bombarded with large gas cluster ions

  Satoshi Ninomiya; Yoshihiko Nakata; Kazuya Ichiki; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Mar. 2007, Peer-reviewed

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• Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere

  K. Ichiki; S. Ninomiya; T. Seki; T. Aoki; J. Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Mar. 2007, Peer-reviewed

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• The effect of incident cluster ion energy and size on secondary ion yields emitted from Si

  Satoshi Ninomiya; Kazuya Ichiki; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Mar. 2007, Peer-reviewed

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• Molecular dynamics study of surface modification with a glancing angle gas cluster ion beam

  Takaaki Aoki; Jiro Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Feb. 2007, Peer-reviewed

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• Ion-induced emission of amino acid molecular ions from thin films

  Y. Nakata; Y. Honda; S. Ninomiya; J. Matsuo

  TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 2007

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• The effect of incident cluster ion size on secondary ion yields produced from Si

  Satoshi Ninomiya; Kazuya Ichiki; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 32, NO 4, 2007, Peer-reviewed

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• Secondary ion measurements for oxygen cluster ion SIMS

  Satoshi Ninomiya; Takaaki Aoki; Toshio Seki; Jiro Matsuo

  APPLIED SURFACE SCIENCE, Jul. 2006, Peer-reviewed

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• Molecular dynamics study of particle emission by reactive cluster ion impact

  Takaaki Aoki; Jiro Matsuo

  APPLIED SURFACE SCIENCE, Jul. 2006, Peer-reviewed

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• High-intensity Si cluster ion emission from a silicon target bombarded with large Ar cluster ions

  Satoshi Ninomiya; Takaaki Aoki; Toshio Seki; Jiro Matsuo

  APPLIED SURFACE SCIENCE, Jul. 2006, Peer-reviewed

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• ITO surface smoothing with argon cluster ion beam

  C Heck; T Seki; T Oosawa; M Chikamatsu; N Tanigaki; T Hiraga; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jan. 2006, Peer-reviewed

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• High-Speed Nano-Processing with Cluster Ion Beams

  瀬木 利夫; 松尾 二郎

  AIP Conference Proceedings, Jan. 2006, Peer-reviewed

  
• Cluster size dependence of sputtering yield by cluster ion beam irradiation

  T Seki; T Murase; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jan. 2006, Peer-reviewed

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• Molecular dynamics simulations of surface modification and damage formation by gas cluster ion impacts

  T Aoki; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jan. 2006, Peer-reviewed

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• Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions

  T. Aoki; J. Matsuo

  Materials Research Society Symposium Proceedings, 2006, Peer-reviewed

  
• Sidewall polishing with a gas cluster ion beam for photonic device applications

  E Bourelle; A Suzuki; A Sato; T Seki; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Dec. 2005, Peer-reviewed

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• Energy distributions of high current cluster ion beams

  T Seki; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Dec. 2005, Peer-reviewed

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• Molecular dynamics study of the angular dependence of reactive cluster impacts

  T Aoki; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Dec. 2005, Peer-reviewed

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• Development of 1 mA cluster ion beam source

  T Seki; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Aug. 2005, Peer-reviewed

  
• Size and energy distribution of gas cluster ion beam measured by energy resolved time of flight mass spectroscopy

  S Kakuta; T Seki; S Sasaki; K Furusawa; T Aoki; J Matsuo

  SURFACE & COATINGS TECHNOLOGY, Jun. 2005, Peer-reviewed

  
• A Comparison of Ions with Neutrals Emitted from Semiconductors Bombarded by MeV Si Ions

  Yoshihiko Nakata; Satoshi Ninomiya; Takaaki Aoki; Hidetsugu Tsuchida; Jiro Matsuo; Akio Itoh

  Transactions of the Materials Research Society of Japan, Jun. 2005, Peer-reviewed

  
• Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts

  T. Aoki; J. Matsuo

  Materials Research Society Symposium Proceedings, 2005, Peer-reviewed

  
• Organic electroluminescent device on ITO smoothed with Ar cluster ion beam

  Claire Heck; Takeru Oosawa; Masayuki Chikamatsu; Nobu Tanigaki; Toshio Seki; Jiro Matsuo

  Nonlinear Optics Quantum Optics, 2005, Peer-reviewed

  
• Comparison of irradiation effects between cluster and monomer for DLC film deposition

  Teruyuki Kitagawa; Noriaki Toyoda; Harushige Tsubakino; Jiro Matsuo; Isao Yamada

  Novel Materials Processing by Advanced Electromagnetic Energy Sources, 2005, Peer-reviewed

  
• Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques

  H. Kageyama; T. Asanuma; T. Takeuchi; K. Kadono; J. Matsuo; T. Seki; T. Kitagawa; N. Toyoda; Y. Shimizugawa; T. Uruga

  Physica Scripta T, 2005, Peer-reviewed

  
• Glancing angle fluorescence XAFS study on metal oxide thin films obtained by oxygen gas cluster ion beam assisted deposition techniques

  Kageyama H; Asanuma T; Takeuchi T; Kadono K; Matsuo J; Seki T; Kitagawa T; Toyoda N; Shimizugawa Y; Uruga T

  PHYSICA SCRIPTA, 2005, Peer-reviewed

  
• Polishing of sidewall surfaces using a gas cluster ion beam

  E Bourelle; A Suzuki; A Sato; T Seki; J Matsuo

  JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, Oct. 2004, Peer-reviewed

  
• A new secondary ion mass spectrometry (SIMS) system with high-intensity cluster ion source

  J Matsuo; C Okubo; T Seki; T Aoki; N Toyoda; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 2004, Peer-reviewed

  
• Surface smoothing with large current cluster ion beam

  T Seki; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Feb. 2004, Peer-reviewed

  
• Surface modification with gas cluster ion beams from fundamental characteristics to applications

  N. Toyoda; J. Matsuo; I. Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Feb. 2004, Peer-reviewed

  
• Molecular Dynamics Study Of Surface Morphological Evolution By Cluster Impacts

  Takaaki Aoki; Jiro Matsuo; Isao Yamada

  MRS Proceedings, 2004, Peer-reviewed

  
• Molecular effect on projected range in ultralow-energy ion implantation

  K. Kimura; Y. Oota; K. Nakajima; M. Suzuki; T. Aoki; J. Matsuo; A. Agarwal; B. Freer; A. Stevenson; M. Ameen

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Oct. 2003

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• METI/NEDO Projects on Cluster Ion Beam Process Technology

  Isao Yamada; Jiro Matsuo; Noriaki Toyoda

  AIP Conference Proceedings, 26 Aug. 2003, Peer-reviewed

  
• Near edge X-ray absorption fine structure study for optimization of hard diamond-like carbon film formation with Ar cluster ion beam

  Kitagawa T; Miyauchi K; Kanda K; Shimizugawa Y; Toyoda N; Tsubakino H; Matsui S; Matsuo J; Yamada I

  JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, Jun. 2003, Peer-reviewed

  
• Cluster species and cluster size dependence of damage formation by cluster ion impact

  T Aoki; J Matsuo; G Takaoka; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 2003, Peer-reviewed

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• Atomistic study of cluster collision on solid surfaces

  J Matsuo; T Seki; T Aoki; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 2003, Peer-reviewed

  
• Cluster ion beam process technology

  Yamada, I; J Matsuo; N Toyoda

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 2003, Peer-reviewed

  
• Gold nanoparticles sputtered by single ions and clusters

  R. C. Birtcher; A. W. McCormick; P. M. Baldo; N. Toyoda; I. Yamada; J. Matsuo

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, May 2003, Peer-reviewed

  
• Influence of residual Ar+ in Ar cluster ion beam for DLC film formation

  Teruyuki Kitagawa; Kazuya Miyauchi; Noriaki Toyoda; Kazuhiro Kanda; Tokumi Ikeda; Harushige Tsubakino; Jiro Matsuo; Shinji Matsui; Isao Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, May 2003, Peer-reviewed

  
• Defect characteristics by boron cluster ion implantation

  Takaaki Aoki; Jiro Matsuo; Gikan Takaoka; Noriaki Toyoda; Isao Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, May 2003

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• Modeling of surface smoothing process by cluster ion beam irradiation

  A. Nakai; T. Aoki; T. Seki; J. Matsuo; G. H. Takaoka; I. Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, May 2003, Peer-reviewed

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• Generation of the large current cluster ion beam

  T. Seki; J. Matsuo; G. H. Takaoka; I. Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, May 2003, Peer-reviewed

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• Titanium-dioxide film formation using gas cluster ion beam assisted deposition technique

  O. Nakatsu; J. Matsuo; K. Omoto; T. Seki; G. Takaoka; I. Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, May 2003

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• Molecular dynamics study of damage formation characteristics by large cluster ion impacts

  Takaaki Aoki; Jiro Matsuo; Gikan Takaoka

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Apr. 2003, Peer-reviewed

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• Hard DLC film formation by gas cluster ion beam assisted deposition

  Teruyuki Kitagawa; Isao Yamada; Noriaki Toyoda; Harushige Tsubakino; Jiro Matsuo; G. H. Takaoka; Allen Kirkpatrick

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Feb. 2003, Peer-reviewed

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• クラスターイオン衝突における非線形照射効果とそのプロセス応用

  松尾 二郎; 瀬木 利夫; 青木 学聡

  高温学会誌, 2003, Peer-reviewed

  
• Difference of irradiation effects between Ar cluster ion and Ar+ for DLC film formation

  Kitagawa T; Miyauchi K; Kanda K; Matsui S; Toyoda N; Tsubakino H; Matsuo J; Yamada I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, Peer-reviewed

  
• Secondary ion mass spectrometry with gas cluster ion beams

  Noriaki Toyoda; Jiro Matsuo; Takaaki Aoki; Isao Yamada; David B. Fenner

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, May 2002, Peer-reviewed

  
• Scanning tunneling microscope observations of Ge deposition on Si(111)-7 × 7 surfaces irradiated by Xe ions

  G. H. Takaoka; T. Seki; K. Tsumura; J. Matsuo

  Thin Solid Films, 22 Feb. 2002

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• High quality ITO film formation by the simultaneous use of cluster ion beam and laser irradiation

  G. H. Takaoka; D. Yamazaki; J. Matsuo

  Materials Chemistry and Physics, 01 Feb. 2002, Peer-reviewed

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• NEXAFS study for optimization of hard DLC films formation with Ar cluster ion beam

  T. Kitagawa; K. Miyauchi; K. Kanda; Y. Shimizugawa; N. Toyoda; H. Tsubakino; S. Matsui; T. Gego; J. Matsuo; I. Yamada

  2002 International Microprocesses and Nanotechnology Conference, MNC 2002, 2002, Peer-reviewed

  
• Cluster ion beam processing - METI/NEDO projects and recent progress

  Isao Yamada; Jiro Matsuo; Noriaki Toyoda

  Proceedings of the International Conference on Ion Implantation Technology, 2002, Peer-reviewed

  
• Interaction of SF6 cluster ion beams with Si surface

  GH Takaoka; S Nakamura; T Seki; J Matsuo

  JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, Dec. 2001

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• Modification of polycarbonate and polypropylene surfaces by argon ion cluster beams

  H. Biederman; D. Slavinska; H. Boldyreva; H. Lehmberg; G. Takaoka; J. Matsuo; H. Kinpara; J. Zemek

  Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Nov. 2001, Peer-reviewed

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• Materials processing by gas cluster ion beams

  Yamada I; Matsuo J; Toyoda N; Kirkpatrick A

  MATERIALS SCIENCE & ENGINEERING R-REPORTS, 30 Oct. 2001, Peer-reviewed

  
• Cluster size effect on reactive sputtering by fluorine cluster impact using molecular dynamics simulation

  T Aoki; J Matsuo; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 2001, Peer-reviewed

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• Molecular dynamics simulation of fluorine ion etching of silicon

  S Chiba; T Aoki; J Matsuo

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 2001, Peer-reviewed

  
• Molecular dynamics and Monte-Carlo simulation of sputtering and mixing by ion irradiation

  T Aoki; S Chiba; J Matsuo; Yamada, I; JP Biersack

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 2001, Peer-reviewed

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• O-2 cluster ion assisted deposition for tin doped indium oxide (ITO) films

  J Matsuo; G Takaoka; Yamada, I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2001, Peer-reviewed

  
• Nano-processing with gas cluster ion beams

  Yamada, I; J Matsuo; Z Insepov; T Aoki; T Seki; N Toyoda

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2000, Peer-reviewed

  
• STM observation of surface vacancies created by ion impact

  T Seki; T Aoki; J Matsuo; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2000, Peer-reviewed

  
• Molecular dynamics simulation of fluorine cluster ion impact

  T Aoki; J Matsuo; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Apr. 2000, Peer-reviewed

  
• UHV-STM study on ion-assisted deposition

  T Seki; J Matsuo; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Mar. 2000, Peer-reviewed

  
• Shallow junction formation by decaborane molecular ion implantation

  Majeed A. Foad; Roger Webb; Roger Smith; Jiro Matsuo; Amir Al-Bayati; T-Sheng-Wang; Tony Cullis

  Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Jan. 2000, Peer-reviewed

  
• Proposal for a hardness measurement technique without indentor by gas-cluster-beam bombardment

  Zinetulla Insepov; Rafael Manory; Jiro Matsuo; Isao Yamada

  Physical Review B - Condensed Matter and Materials Physics, 2000, Peer-reviewed

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• O2 cluster ion-assisted deposition for tin-doped indium oxide films

  Jiro Matsuo; Hiroshi Katsumata; Eiji Minami; Isao Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 2000, Peer-reviewed

  
• Surface smoothing mechanism of gas cluster ion beams

  Noriaki Toyoda; Norihisa Hagiwara; Jiro Matsuo; Isao Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 2000, Peer-reviewed

  
• Etching, smoothing, and deposition with gas-cluster ion beam technology

  J. A. Greer; D. B. Fenner; J. Hautala; L. P. Allen; V. DiFilippo; N. Toyoda; I. Yamada; J. Matsuo; E. Minami; H. Katsumata

  Surface and Coatings Technology, 2000, Peer-reviewed

  
• Polycarbonate surface modified by argon cluster ion beams

  J Zemek; I Yamada; G Takaoka; J Matsuo

  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Nov. 1999, Peer-reviewed

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• Cluster size dependence of the impact process on a carbon substrate

  T Aoki; T Seki; J Matsuo; Z Insepov; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jun. 1999, Peer-reviewed

  
• Decaborane (B10H14) ion implantation technology for sub-0.1-mu m PMOSFET's

  K Goto; J Matsuo; Y Tada; T Sugii; Yamada, I

  IEEE TRANSACTIONS ON ELECTRON DEVICES, Apr. 1999, Peer-reviewed

  
• Optical thin film formation by gas-cluster ion beam assisted deposition

  H Katsumata; J Matsuo; T Nishihara; T Tachibana; K Yamada; M Adachi; E Minami; Yamada, I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, Peer-reviewed

  
• Ultra low energy boron implantation using cluster ions for decananometer MOSFETs

  T Sugii; K Goto; T Tanaka; J Matsuo; Yamada, I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, Peer-reviewed

  
• Applications of cluster ion implantation in microelectronics devices

  Yamada I; Matsuo J; Toyoda N; Aoki T

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, Peer-reviewed

  
• High-intensity oxygen cluster ion beam generation and its application to cluster ion-assisted deposition

  J. Matsuo; E. Minami; M. Saito; N. Toyoda; H. Katsumata; I. Yamada

  European Physical Journal D, 1999, Peer-reviewed

  
• Surface treatment of diamond films with Ar and O2 cluster ion beams

  N. Toyoda; N. Hagiwara; J. Matsuo; I. Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1999, Peer-reviewed

  
• Surface smoothing of CVD-diamond membrane for X-ray lithography by gas cluster ion beam

  Nishiyama A; Adachi M; Toyoda N; Hagiwara N; Matsuo J; Yamada I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, Peer-reviewed

  
• Non-linear processes in the gas cluster ion beam modification of solid surfaces

  Yamada I; Matsuo J; Toyoda N; Aoki T; Jones E; Insepov Z

  MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 30 Sep. 1998, Peer-reviewed

  
• Cluster ion bombardment on atomically flat Au(111) solid surfaces

  D Takeuchi; T Seki; T Aoki; J Matsuo; Yamada, I

  MATERIALS CHEMISTRY AND PHYSICS, Jul. 1998, Peer-reviewed

  
• Molecular dynamics simulation of a carbon cluster ion impacting on a carbon surface

  T Aoki; T Seki; J Matsuo; Z Insepov; Yamada, I

  MATERIALS CHEMISTRY AND PHYSICS, Jul. 1998, Peer-reviewed

  
• Energy dependence of a single trace created by C-60 ion impact

  T Seki; T Aoki; M Tanomura; J Matsuo; Yamada, I

  MATERIALS CHEMISTRY AND PHYSICS, Jul. 1998, Peer-reviewed

  
• Indium oxide film formation by O-2 cluster ion-assisted deposition

  W Qin; RP Howson; M Akizuki; J Matsuo; G Takaoka; Yamada, I

  MATERIALS CHEMISTRY AND PHYSICS, Jul. 1998, Peer-reviewed

  
• Reduction of boron transient enhanced diffusion in silicon by low-energy cluster ion implantation

  N Shimada; T Aoki; J Matsuo; Yamada, I; K Goto; T Sugui

  MATERIALS CHEMISTRY AND PHYSICS, Jul. 1998, Peer-reviewed

  
• Low-temperature formation of perovskite PbTiO3 films by O-2 cluster ion-assisted deposition

  M Akizuki; J Matsuo; W Qin; T Aoki; M Harada; S Ogasawara; K Yodoshi; Yamada, I

  MATERIALS CHEMISTRY AND PHYSICS, Jul. 1998, Peer-reviewed

  
• Cluster ion beam processing

  Isao Yamada; Jiro Matsuo

  Materials Science in Semiconductor Processing, 01 Apr. 1998, Peer-reviewed

  
• Present Trend of Ion Engineering Research. Gas Cluster Ion Beam Formation and Applications.

  山田 公; 松尾 二郎

  IEEJ Transactions on Sensors and Micromachines, 01 Mar. 1998

  
• High performance 0.04 mu m PMOSFET

  K Goto; T Sugii; J Matsuo

  FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1998, Peer-reviewed

  
• Smoothing of YBa2Cu3O7-δ films by ion cluster beam bombardment

  W. K. Chu; Y. P. Li; J. R. Liu; J. Z. Wu; S. C. Tidrow; N. Toyoda; J. Matsuo; I. Yamada

  Applied Physics Letters, 1998, Peer-reviewed

  
• Angular distributions of the particles sputtered with Ar cluster ions

  Noriaki Toyoda; Hiroaki Kitani; Norihisa Hagiwara; Takaaki Aoki; Jiro Matsuo; Isao Yamada

  Materials Chemistry and Physics, 1998, Peer-reviewed

  
• Surface smoothing effects with reactive cluster ion beams

  Noriaki Toyoda; Hiroaki Kitani; Norihisa Hagiwara; Jiro Matsuo; Isao Yamada

  Materials Chemistry and Physics, 1998, Peer-reviewed

  
• Gas cluster ion beam processing

  Yamada I; Matsuo J; Toyoda N; Aoki T; Jones E; Insepov Z

  SIMILARITIES AND DIFFERENCES BETWEEN ATOMIC NUCLEI AND CLUSTERS, 1998, Peer-reviewed

  
• STM observation of HOPG surfaces irradiated with Ar cluster ions

  T Seki; T Kaneko; D Takeuchi; T Aoki; J Matsuo; Z Insepov; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jan. 1997, Peer-reviewed

  
• クラスターイオンの非線形効果(原子核とマイクロララスターの類似性と異質性,研究会報告)

  瀬木 利夫; 田能村 昌宏; 松尾 二郎; 山田 公

  素粒子論研究, 1997, Peer-reviewed

  
• Preparation and catalytic activity of nano-scale Au islands supported on TiO2

  GH Takaoka; T Hamano; K Fukushima; J Matsuo; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jan. 1997, Peer-reviewed

  
• Molecular dynamics simulation of damage formation by cluster ion impact

  T Aoki; J Matsuo; Z Insepov; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jan. 1997, Peer-reviewed

  
• Non-linear effects in high energy cluster ion implantation

  D Takeuchi; T Aoki; J Matsuo; Yamada, I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 1997, Peer-reviewed

  
• Cluster ion assisted thin film formation

  J Matsuo; M Akizuki; Yamada, I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 1997, Peer-reviewed

  
• Fullerene ion irradiation to silicon

  M Tanomura; D Takeuchi; J Matsuo; GH Takaoka; Yamada, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jan. 1997, Peer-reviewed

  
• A high performance 50nm PMOSFET using decaborane (B10H14) ion implantation and 2-step activation annealing process

  K Goto; J Matsuo; Y Tada; T Tanaka; Y Momiyama; T Sugii; Yamada, I

  INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, Peer-reviewed

  
• The sputtering effects of cluster ion beams

  Toyoda N; Matsuo J; Yamada I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY - PROCEEDINGS OF THE FOURTEENTH INTERNATIONAL CONFERENCE, PTS 1 AND 2, 1997, Peer-reviewed

  
• Reactive sputtering by SF6 cluster ion beams

  N. Toyoda; H. Kitani; J. Matsuo; I. Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, Peer-reviewed

  
• Incident angle dependence of the sputtering effect of Ar-cluster-ion bombardment

  H. Kitani; N. Toyoda; J. Matsuo; I. Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, Peer-reviewed

  
• Sputtering of elemental metals by Ar cluster ions

  Jiro Matsuo; Noriaki Toyoda; Makoto Akizuki; Isao Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, Peer-reviewed

  
• Nanofabrication technology by gas cluster ion beams

  Matsuo J; Toyoda N; Yamada I

  JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, Nov. 1996, Peer-reviewed

  
• Fundamental aspects of the ionized cluster-beam deposition process

  GH Takaoka; J Matsuo; CE Ascheron; Yamada, I

  SURFACE REVIEW AND LETTERS, Feb. 1996, Peer-reviewed

  
• Sputtering with gas cluster-ion beams

  J Matsuo; M Akizuki; J Northby; GH Takaoka; Yamada, I

  SURFACE REVIEW AND LETTERS, Feb. 1996, Peer-reviewed

  
• Cluster ion bombardment-induced surface damage of Si

  CE Ascheron; M Akizuki; J Matsuo; Z Insepov; GH Takaoka; Yamada, I

  SURFACE REVIEW AND LETTERS, Feb. 1996, Peer-reviewed

  
• Low-Temperature Oxidation of Silicon by O2 Cluster Ion Beams.

  Akizuki Makoto; Matsuo Jiro; Ogasawara Satoru; Harada Mitsuaki; Doi Atsumasa; Yamada Isao

  Japanese Journal of Applied Physics, 1996

  
• Surface processing by gas cluster ion beams at the atomic (molecular) level

  I. Yamada; J. Matsuo; Z. Insepov; D. Takeuchi; M. Akizuki; N. Toyoda

  Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1996, Peer-reviewed

  
• Atomic level smoothing of CVD diamond films by gas cluster ion beam etching

  Akihisa Yoshida; Masahiro Deguchi; Makoto Kitabatake; Takashi Hirao; Jiro Matsuo; Noriaki Toyoda; Isao Yamada

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1996, Peer-reviewed

  
• Surface modifications by gas cluster ion beams

  Yamada, I; J Matsuo; Z Insepov; M Akizuki

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Dec. 1995, Peer-reviewed

  
• GAS CLUSTER ION-BEAM EQUIPMENTS FOR INDUSTRIAL APPLICATIONS

  J MATSUO; H ABE; GH TAKAOKA; YAMADA, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 1995, Peer-reviewed

  
• SPUTTERING EFFECT OF GAS CLUSTER ION-BEAMS

  T YAMAGUCHI; J MATSUO; M AKIZUKI; CE ASCHERON; GH TAKAOKA; YAMADA, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 1995, Peer-reviewed

  
• LOW-DAMAGE SURFACE PROCESSING BY GAS CLUSTER ION-BEAMS

  M AKIZUKI; J MATSUO; M HARADA; S OGASAWARA; A DOI; K YONEDA; T YAMAGUCHI; GH TAKAOKA; CE ASCHERON; YAMADA, I

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, May 1995, Peer-reviewed

  

Misc.

• ガスクラスターイオンの表面衝突(原子核とマイクロクラスターの類似性と異質性,研究会報告)

  松尾 二郎; 山田 公

  素粒子論研究, 20 Feb. 1996

  
• ガスクラスターイオンの表面衝突(原子核とマイクロクラスターの類似性と異質性,研究会報告)

  松尾 二郎; 山田 公

  物性研究, 1996

  Access this misc :

  
• 31p-PSB-6 Surface Scattering of Cluster Ion

  Matsuo Jiro; Yamada Isao

  Abstracts of the meeting of the Physical Society of Japan. Annual meeting, 15 Mar. 1996

  
• 21aYD-3 Real-time observation of ultra-fast phenomenon by femtosecond laser

  Hada Masaki; Matsuo Jiro

  Meeting abstracts of the Physical Society of Japan, 19 Aug. 2005

  
• 25aYJ-8 Size distributions of positive and negative clusters for sputtering by fast ion bombardment

  Tsuchida H.; Nakata Y.; Nagano M.; Kitagaki S.; Ninomiya S.; Ogawa H.; Sakamotoc N.; Imai M.; Shibata H.; Matsuo J.; Itoh A.

  Meeting abstracts of the Physical Society of Japan, 04 Mar. 2005

  
• 12aTG-6 Measurements of kinetic energy distribution of secondary neutrals emitted from solids under MeV-ion bombardment

  Nakata Y.; Ninomiya S.; Matsuo J.; Itoh A.

  Meeting abstracts of the Physical Society of Japan, 25 Aug. 2004

  
• Defect Formation by Cluster Ion Bombardment

  Matsuo Jiro; Yamada Isao

  Abstracts of the meeting of the Physical Society of Japan. Annual meeting, 16 Mar. 1995

  
• Exploration of Ultrafast Lattice Dynamics with Femtosecond X-ray Probe

  羽田 真毅; 松尾 二郎

  商経学叢, Dec. 2012

  
• Etching Characteristics with Ar-Cl₂ Gas Mixed Cluster Ion Beam

  Seki Toshio; Aoki Takaaki; Matsuo Jiro

  兵庫県立大学工学研究科イオン工学研究室論文集, 2010

  
• 29p-PSB-30 Sputtering by Cluster Ion

  Matsuo Jiro; Yamada Isao

  Abstracts of the meeting of the Physical Society of Japan. Sectional meeting, 12 Sep. 1995

  
• Semiconductor surface treatment with gas cluster ion beam

  Toyoda Noriaki; Kaneko Tsuyoshi; Yoshizawa Tetsu; Akizuki Makoto; Matsuo Jiro; Takaoka Gikan; Yamada Isao

  Technical report of IEICE. SDM, 25 Nov. 1994

  
• Shallow implantation by Gas Source ICB Technique

  Takeuchi Daisuke; Kitai Atsushi; Toyoda Noriaki; Matsuo Jiro; Takaoka Gikan; Yamada Isao

  Technical report of IEICE. SDM, 24 Nov. 1994

  
• Smoothing of SiC surface by Gas Cluster Ion Beams

  TOYODA N.; KITANI H.; MATSUO J.; YAMADA I.

  Technical report of IEICE. SDM, 05 Dec. 1996

  
• Etching by Reactive Cluster Ion Beams

  TOYODA N.; KITANI H.; MATSUO J.; YAMADA I.

  Technical report of IEICE. SDM, 08 Dec. 1995

  
• Shallow junction formation by polyatomic cluster ion implantation

  TAKEUCHI D.; TOYODA N.; SHIMADA N.; MATSUO J.; YAMADA I.

  Technical report of IEICE. SDM, 08 Dec. 1995

  
• 26pWD-8 Secondary ion emission from biomolecular thin films under ion bombardment II

  Nakata Y.; Ninomiya S.; Matsuo J.

  Meeting abstracts of the Physical Society of Japan, 18 Aug. 2006

  
• 26aWB-1 Real-time observation of ultra-fast phenomena with the femto-second X-ray diffraction method

  Hada Masaki; Matsuo Jiro

  Meeting abstracts of the Physical Society of Japan, 18 Aug. 2006

  
• 28pTA-9 Secondary ion emission from biomolecular thin films under ion bombardment

  Nakata Y.; Ninomiya S.; Matsuo J.

  Meeting abstracts of the Physical Society of Japan, 04 Mar. 2006

  
• 19aXJ-5 Secondary ion emission from biomolecular thin films under ion bombardment III

  Nakata Y.; Honda Y.; Ninomiya S.; Matsuo J.

  Meeting abstracts of the Physical Society of Japan, 28 Feb. 2007

  
• 3D molecular imaging of organic multilayer film by Ar gas cluster ion beam SIMS

  Wakamoto K.; Seki T.; Aoki T.; Matsuo J.

  Annual report of Quantum Science and Engineering Center, Apr. 2014

  
• Lipid Compounds Analysis with MeV-SIMS Apparatus

  Fujii M.; Kusakari M.; Seki T.; Aoki T.; Matsuo J.

  Annual report of Quantum Science and Engineering Center, Apr. 2014

  
• Depth analysis of DSPC by SIMS, using gas cluster ion beam

  Nakagawa S.; Seki T.; Aoki T.; Matsuo J.

  Annual report of Quantum Science and Engineering Center, Apr. 2013

  
• X-ray Diffraction Measurements for a Diarylethene Single Crystal for Time-resolved Femtosecond X-ray Diffraction

  Hontani Yusaku; Hada Masaki; Seki Toshio; Aoki Takaaki; Matsuo Jiro

  Annual report of Quantum Science and Engineering Center, Apr. 2013

  
• Preface

  K. Tsutsui; B. Z. Li; I. Mizushima; H. Wakabayashi; K. Suguro; J. Matsuo; Y. L. Jinag; T. Skotnicki; K. Ohuchi; S. Shibata; X. P. Qu; Y. Erokhin; T. Skotnicki

  15th International Workshop on Junction Technology, IWJT 2015, 09 May 2016

  
• Development of ambient SIMS using MeV-energy ion probe

  Kusakari M.; Fujii M.; Seki T.; Aoki T.; Matsuo J.

  Annual report of Quantum Science and Engineering Center, Apr. 2016

  
• Development of Low-Vacuum SIMS Instruments with Large Cluster Ion Beam

  Suzuki K.; Kusakari M.; Seki T.; Aoki T.; Matsuo J.

  Annual report of Quantum Science and Engineering Center, Apr. 2016

  
• High sensitive detection and molecular imaging of lipid molecules with cluster SIMS

  Matsuo Jiro; Nakagawa Shunichiro; Torii Souta; Fujii Makiko; Seki Toshio; Aoki Takaaki

  Abstract of annual meeting of the Surface Science of Japan, 2013

  
• Ultrafast Hot Electron Induced Phase Transitions in Vanadium Dioxide

  M. Hada; Y. Hontani; R. E. Marvel; R. F. Haglund; J. Matsuo

  XVIIITH INTERNATIONAL CONFERENCE ON ULTRAFAST PHENOMENA, 2013, Peer-reviewed

  
• Beam Interactions with Materials and Atoms Section B of: Nuclear Instruments & Methods in Physics Research

  Kai Nordlund; John Baglin; Maria-Grazia Grimaldi; Jiro Matsuo; Jan Meijer

  NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, Jul. 2012

  
• Cluster SIMS analysis of lipid thin films

  松尾 二郎; 中川 駿一郎; 志戸本 祥; 鳥居 聡太; 瀬木 利夫; 青木 学聡

  Abstract of annual meeting of the Surface Science of Japan, 2012

  
• Bio-SIMS with Novel Primary Ion Beams toward Molecular-Imaging

  Matsuo Jiro; Ichiki Kazuya; Seki Toshio; Aoki Takaaki

  Abstract of annual meeting of the Surface Science of Japan, 2011

  
• Sputtering yield measurements with size-selected gas cluster ion beams

  Ichiki, Kazuya; Ninomiya, Satoshi; Seki, Toshio; Aoki, Takaaki; Matsuo, Jiro

  MRS Proceedings,1181, pp. 135-140, Jan. 2011, Peer-reviewed

  
• Preface

  K. Tsutsui; B.-Z. Li; I. Mizushima; K. Suguro; Y. Kawasaki; Y.-L. Jiang; T. Skotnicki; S. Shishiguchi; J. Matsuo; H. Wakabayashi; X.-P. Qu; Y. Erokhin; T. Skotnicki

  Extended Abstracts of the 11th International Workshop on Junction Technology, IWJT 2011, 2011, Peer-reviewed

  
• Evaluation of lattice motion in CdTe single crystal using in-air tabletop time-resolved X-ray diffractometer

  Masaki Hada; Jiro Matsuo

  BURIED INTERFACE SCIENCES WITH X-RAYS AND NEUTRONS 2010, 2011, Peer-reviewed

  
• クラスターイオンビーム技術の最近の進展 (特集 クラスタービームとその応用技術)

  松尾 二郎; 瀬木 利夫; 青木 学聡

  表面科学,31 (11), pp. 564-571, Nov. 2010, Peer-reviewed

  
• Characteristics of organic depth profiling using large cluster ion beams

  Satoshi Ninomiya; Kazuya Ichiki; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Extended Abstracts of 10th Workshop on Cluster Ion Beam Technology, Jun. 2010

  
• MD simulation of small boron cluster implantation

  Aoki, Takaaki; Seki, Toshio; Matsuo, Jiro

  2010 International Workshop on Junction Technology Extended Abstracts,, pp. 1-2, May 2010

  
• Surface smoothing with energetic cluster ion beams

  MATSUO Jiro; SEKI Toshio; NINOMIYA Satoshi; AOKI Takaaki

  Journal of the Japan Society for Abrasive Technology, 01 May 2010, Peer-reviewed

  
• Novel SIMS techniques for organic and biological materials with high-density excited primary ion beams

  MATSUO Jiro

  応用物理, 10 Apr. 2010, Peer-reviewed

  
• Lipid Imaging of Rat Brain Tissue with Swift Heavy Ions

  Wakamatsu Yoshinobu; Yamada Hideaki; Ninomiya Satoshi; Seki Toshio; Aoki Takaaki; Ishihara Akihiko; Matsuo Jiro

  Abstract of annual meeting of the Surface Science of Japan, 2010

  
• Instrumental development of imaging mass spectrometry with ToF-SIMS using Ar cluster

  yamamoto yasuyuki; ichiki kazuya; ninomiya satoshi; seki toshio; aoki takaaki; matsuo jirou

  Abstract of annual meeting of the Surface Science of Japan, 2010

  
• SIMS for biological Applications

  Matsuo Jiro; Ichiki Kazuya; Yamamoto Yasuyuki; Wakamatsu Yoshinobu; Aoki Takaaki; Seki Toshio

  Abstract of annual meeting of the Surface Science of Japan, 2010

  
• Coherent acoustic phonons in highly oriented bismuth films monitored by femtosecond electron diffraction

  G. Sciaini; M. Hada; J. Matsuo; A. Karantza; G. Moriena; R.J. Dwayne Mi

  Optics InfoBase Conference Papers, 2010, Peer-reviewed

  
• 18^th International Conference on Ion Implantation Technology

  J. Matsuo; M. Kase; T. Aoki; T. Seki

  AIP Conference Proceedings, 2010, Peer-reviewed

  
• IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology: Foreword

  Y.-L. Jiang; S. Shishiguchi; J. Matsuo; H. Wakabayashi; Y.-C. Yeo; S. Deleonibus

  IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology, 2010, Peer-reviewed

  
• MD simulation of small boron cluster implantation

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology, 2010, Peer-reviewed

  
• High Speed Si Etching with ClF3 Cluster Injection

  T. Seki; Y. Yoshino; T. Senoo; K. Koike; S. Ninomiya; T. Aoki; J. Matsuo

  ION IMPLANTATION TECHNOLOGY 2010, 2010, Peer-reviewed

  
• Energy effects on the sputtering yield of Si bombarded with gas cluster ion beams

  K. Ichiki; S. Ninomiya; T. Seki; T. Aoki; J. Matsuo

  ION IMPLANTATION TECHNOLOGY 2010, 2010, Peer-reviewed

  
• Evaluation of Surface Damage of Organic Films due to Irradiation with Energetic Ion Beams

  Masaki Hada; Yusaku Hontani; Sachi Ibuki; Kazuya Ichiki; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  ION IMPLANTATION TECHNOLOGY 2010, 2010, Peer-reviewed

  
• Biomolecular Emission by Swift Heavy Ion Bombardment

  Yoshinobu Wakamatsu; Hideaki Yamada; Satoshi Ninomiya; Brian N. Jones; Toshio Seki; Takaaki Aoki; Roger Webb; Jiro Matsuo

  ION IMPLANTATION TECHNOLOGY 2010, 2010, Peer-reviewed

  
• Evaluation of surface damage on organic materials irradiated with Ar cluster ion beam

  Y. Yamamoto; K. Ichiki; S. Ninomiya; T. Seki; T. Aoki; J. Matsuo

  ION IMPLANTATION TECHNOLOGY 2010, 2010, Peer-reviewed

  
• SIMS depth profiling of organic films with Ar cluster ion beams

  Satoshi Ninomiya; Kazuya Ichiki; Yoshihiko Nakata; Hideaki Yamada; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Extended Abstracts of 9th Workshop on Cluster Ion Beam Technology, 2009

  
• Developing SIMS at low vacuum using fast heavy ions

  Wakamatsu Yoshinobu; Yamada Hideaki; Nakata Yoshihiko; Ninomiya Satoshi; Seki Toshio; Aoki Takaaki; Matsuo Jiro

  Abstract of annual meeting of the Surface Science of Japan, 2009

  
• Stress measurement of carbon cluster implanted layers with in-plane diffraction technique

  Jiro Matsuo; Kazuya Ichiki; Masaki Hada; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Tsutomu Nagayama; Masayasu Tanjyo

  Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 2009, Peer-reviewed

  
• Study of damage accumulation and annealing process at low energy boron implantation using molecular dynamics simulations

  T. Aoki; J. Matsuo

  Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009, 2009, Peer-reviewed

  
• Imaging Mass Spectrometry with Swift Heavy Ions

  NAKATA Yoshihiko; YAMADA Hideaki; HONDA Yoshiro; NINOMIYA Satoshi; SEKI Toshio; AOKI Takaaki; MATSUO Jiro

  Journal of the Mass Spectrometry Society of Japan, 01 Aug. 2008

  
• 24aRB-2 A New Approach to High Resolution Imaging Mass Spectrometry

  Nakata Y.; Honda Y.; Ninomiya S.; Seki T.; Aoki T.; Matsuo J.

  Meeting Abstracts of the Physical Society of Japan, 2008

  
• 23aRB-2 The effect of incident velocity of large Ar cluster ions on secondary ion emission for Si

  Ninomiya S.; Ichiki K.; Nakata Y.; Seki T.; Aoki T.; Matsuo J.

  Meeting Abstracts of the Physical Society of Japan, 2008

  
• Recent Progress in Cluster Ion Beam:-Toward Nano-Processing and Advanced Material Analysis

  Matsuo Jiro; Ninomiya Satoshi; Aoki Takaaki; Seki Toshio

  Journal of Surface Analysis, 2008

  
• Study of density effect of large gas cluster impact by molecular dynamics simulations

  青木 学聡; Seki Toshio; Matsuo Jiro

  Annual report of Ion Beam Engineering Laboratory, University of Hyogo, 2008

  
• High-speed processing with Cl2 cluster ion beam

  瀬木 利夫; Aoki Takaaki; Matsuo Jiro

  Annual report of Ion Beam Engineering Laboratory, University of Hyogo, 2008

  
• Investigation of Damage with Cluster Ion Beam Irradiation Using HR-RBS

  Toshio Seki; Takaaki Aoki; Jiro Matsu

  ION IMPLANTATION TECHNOLOGY 2008, 2008, Peer-reviewed

  
• Computer modeling of cluster ion impacts

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  EXTENDED ABSTRACTS 2008 INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY, 2008, Peer-reviewed

  
• Ionization and low damage etching of soft materials with slow Ar cluster ions

  Satoshi Ninomiya; Kazuya Ichiki; Yoshihiko Nakata; Yoshiro Honda; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Extended Abstracts of 8th Workshop on Cluster Ion Beam Technology, 2007

  
• 19aXJ-4 Measurements of secondary ion yields under size-selected cluster ion irradiation

  Ninomiya S.; Ichiki K.; Nakata Y.; Seki T.; Aoki T.; Matsuo J.

  Meeting Abstracts of the Physical Society of Japan, 2007

  
• Cluster ion implantation - Prospects and challenges

  Jiro Matsuo; Takaaki Aoki; Toshio Seki

  Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 2007, Peer-reviewed

  
• MD study of damage structures with poly-atomic boron cluster implantation

  Takaaki Aoki; Toshio Seki; Jiro Matsuo

  Extended Abstracts of the 7th International Workshop on Junction Technology, IWJT 2007, 2007, Peer-reviewed

  
• Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere

  Kazuya Ichiki; Satoshi Ninomiya; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 2006

  
• The effect of incident cluster ion size on secondary ion yields emitted from Si

  Satoshi Ninomiya; Kazuya Ichiki; Yoshihiko Nakata; Toshio Seki; Takaaki Aoki; Jiro Matsuo

  Extended Abstracts of 7th Workshop on Cluster Ion Beam and Advanced Quantum Beam Process Technology, 2006

  
• 28aTA-6 Incident cluster ion dependence of ionization probability on sputtering

  Ninomiya S.; Aoki T.; Seki T.; Nakata Y.; Ichiki K.; Matsuo J.

  Meeting Abstracts of the Physical Society of Japan, 2006

  
• 26pWD-7 Measurements of secondary ions produced by size-selected cluster ions

  Ninomiya S.; Ichiki K.; Nakata Y.; Seki T.; Aoki T.; Matsuo J.

  Meeting Abstracts of the Physical Society of Japan, 2006

  
• Incident size dependence of secondary ion yields emitted from biomolecules under Ar cluster ion bombardment

  Ninomiya Satoshi; Ichiki Kazuya; Nakata Yoshihiko; Seki Toshio; Aoki Takaaki; Matsuo Jiro

  Abstract of annual meeting of the Surface Science of Japan, 2006

  
• Incident cluster size dependence of secondary ion yields

  Ichiki Kazuya; Ninomiya Satoshi; Seki Toshio; Aoki Takaaki; Matsuo Jiro

  Abstract of annual meeting of the Surface Science of Japan, 2006

  
• High-speed nano-processing with cluster ion beams

  T. Seki; J. Matsuo

  ION IMPLANTATION TECHNOLOGY, 2006, Peer-reviewed

  
• Large Cluster Ions as Projectiles for SIMS-Opportunities and Challenges

  Matsuo, Jiro; Aoki, Takaaki; Seki, Toshio

  Proceedings of 18th Annual Workshop on SIMS,, pp. 29-32, May 2005, Peer-reviewed

  
• Total sputtering yields of solids under MeV-energy Si ion bombardment

  Satoshi Ninomiya; Chikage Imada; Masafumi Nagai; Yoshihiko Nakata; Takaaki Aoki; Jiro Matsuo; Nobutsugu Imanishi

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Apr. 2005

  
• Secondary neutral and ionized particle measurements under MeV-energy ion bombardment

  Yoshihiko Nakata; Satoshi Ninomiya; Chikage Imada; Masafumi Nagai; Takaaki Aoki; Jiro Matsuo; Nobutsugu Imanishi

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Apr. 2005

  
• 25aYJ-6 A comparison of total sputtering yields measured with several methods

  Ninomiya S; Nakata Y; Aoki T; Matsuo J; Ito A

  Meeting Abstracts of the Physical Society of Japan, 2005

  
• 25aYJ-9 Measurements of yields and kinetic energies of secondary neutrals spattered by swift ion

  Nakata Y; Ninomiya S; Aoki T; Tsuchida H; Matsuo J; Itoh A

  Meeting Abstracts of the Physical Society of Japan, 2005

  
• 19pYR-5 Secondary ion emission from semiconductors under large gas cluster Ion bombardment

  Ninomiya S.; Aoki T.; Seki T.; Matsuo J.

  Meeting Abstracts of the Physical Society of Japan, 2005

  
• 19pYR-9 Excited molecule emissions under MeV-energy ion bombardment

  Nakata Y; Ninomiya S; Aoki T; Tsuchida H; Matsuo J; Itoh A

  Meeting Abstracts of the Physical Society of Japan, 2005

  
• Molecular dynamics simulations of sequential cluster ion impacts

  Takaaki Aoki; Jiro Matsuo

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Jan. 2005

  
• Surface structure dependence of impact processes of gas cluster ions

  Takaaki Aoki; Jiro Matsuo; Isao Yamada

  Novel Materials Processing by Advanced Electromagnetic Energy Sources, 2005

  
• Gas cluster ion beam source for secondary ion emission measurements

  L. K. Ono; T. Aoki; T. Seki; J. Matsuo; A. Itoh

  Novel Materials Processing by Advanced Electromagnetic Energy Sources, 2005

  
• Molecular dynamics simulations of the cluster-size effect on the sputtering process with reactive gas cluster ions

  T. Aoki; J. Matsuo

  Materials Research Society Symposium Proceedings, 2005, Peer-reviewed

  
• Molecular dynamics study of suface structure and sputtering process by sequencial fluorine cluster impacts

  T Aoki; J Matsuo

  Surface Engineering 2004 - Fundamentals and Applications, 2005, Peer-reviewed

  
• Low damage smoothing of magnetic materials using oblique irradiation of gas cluster ion beam

  S Kakuta; S Sasaki; K Furusawa; T Seki; T Aoki; J Matsuo

  Surface Engineering 2004 - Fundamentals and Applications, 2005, Peer-reviewed

  
• High-speed processing with reactive cluster ion beams

  T Seki; J Matsuo

  Surface Engineering 2004 - Fundamentals and Applications, 2005, Peer-reviewed

  
• Surface structure dependence of impact processes of gas cluster ions

  Takaaki Aoki; Jiro Matsuo

  Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Feb. 2004

  
• Fast Neutral Ar Penetration during Gas Cluster Ion Beam Irradiation into Magnetic Thin Films

  Shigeru Kakuta; Toshio Seki; Shinji Sasaki; Kenji Furusawa; Takaaki Aoki; Jiro Matsuo

  MRS Proceedings, 2004, Peer-reviewed

  
• 12aTG-5 Total sputtering yields of insulators and metals in MeV-energy range

  Ninomiya S; Nakata Y; Aoki T; Matsuo J; Itoh A

  Meeting Abstracts of the Physical Society of Japan, 2004

  
• High-speed processing with cluster ion beams

  T Seki; J Matsuo

  RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 2004, Peer-reviewed

  
• Fast neutral Ar penetration during gas cluster ion beam irradiation into magnetic thin films

  S Kakuta; T Seki; S Sasaki; K Furusawa; T Aoki; J Matsuo

  RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 2004, Peer-reviewed

  
• Molecular dynamics study of surface morphological evolution by cluster impacts

  Takaaki Aoki; Takaaki Aoki; Jiro Matsuo; Isao Yamada; Isao Yamada

  Materials Research Society Symposium - Proceedings, 01 Dec. 2003

  
• XAFS study of thin films fabricated with cluster ion assisted deposition technique

  Matsuo, Jiro; Kitagawa, Teruyuki; Shimizugawa, Yutaka; Kageyama, Hiroyuki; Kanda, Kazuhiro; Seki, Toshio; Aoki, Takaaki; Matsui, Shinji

  Trans. Mat. Res. Soc. Jpn.,28, pp. 101-106, Dec. 2003, Peer-reviewed

  
• Secondary ion mass spectrometry with gas cluster ion beams

  Noriaki Toyoda; Jiro Matsuo; Takaaki Aoki; Isao Yamada; David B. Fenner

  Applied Surface Science, 15 Jan. 2003

  
• High current cluster ion beam source

  T Seki; J Matsuo; GH Takaoka

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, Peer-reviewed

  
• Study of cluster-size effect on damage formation

  T Aoki; T Seki; A Nakai; J Matsuo; G Takaoka

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, Peer-reviewed

  
• Cluster Size Effect on Surface Modification Process using Cluster Ion Beam

  Aoki, Takaaki; Seki, Toshio; Nakai, Atsuko; Matsuo, Jiro; Takaoka; Gikan H

  Trans. Mat. Res. Soc. Jpn.,28 (2), pp. 485-488, Jan. 2003, Peer-reviewed

  
• Threshold energy for generating damage with cluster ion irradiation

  T Seki; T Aoki; A Nakai; J Matsuo; GH Takaoka

  MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 2003, Peer-reviewed

  
• Study of surface morphological evolution by cluster ion irradiation on solid targets

  T Aoki; A Nakai; J Matsuo; G Takaoka

  MORPHOLOGICAL AND COMPOSITIONAL EVOLUTION OF THIN FILMS, 2003, Peer-reviewed

  
• MD simulations of accumulation and desorption with low energy boron implantation

  AOKI Takaaki; MATSUO Jiro; TAKAOKA Gikan

  Technical report of IEICE. SDM, 13 Dec. 2002

  
• Study of damage formation by low-energy boron cluster ion implantation

  Takaaki Aoki; Jiro Matsuo; Gikan Takaoka

  Proceedings of the International Conference on Ion Implantation Technology, 2002

  
• Development of the large current cluster ion beam technology

  Toshio Seki; Jiro Matsuo; Gikan H. Takaoka

  Proceedings of the International Conference on Ion Implantation Technology, 2002, Peer-reviewed

  
• Chemical Reaction of Cluster Ion Beam with Surfaces

  高岡 義寛; 瀬木 利夫; 松尾 二郎

  Proceedings of the 12th Symposium on Beam Engineering of Advanced Material Syntheses, Nov. 2001, Peer-reviewed

  
• Photoluminescence study of defects induced by B₁₀H₁₄ ions

  N. Toyoda; T. Aoki; J. Matsuo; I. Yamada; K. Wada; L.C. Kimerling

  Materials Research Society Symposium - Proceedings, 2001, Peer-reviewed

  
• Materials Research Society Symposium - Proceedings: Preface

  E.C. Jones; K.S. Jones; M.D. Giles; P. Stolk; J. Matsuo

  Materials Research Society Symposium - Proceedings, 2001, Peer-reviewed

  
• Molecular dynamics simulations of cluster ion impact on diamond surface

  T. Aoki; J. Matsuo; G. Takaoka; I. Yamada

  Materials Research Society Symposium - Proceedings, 2001, Peer-reviewed

  
• STM observation of a Si surface irradiated with a single Ar cluster ion

  Seki, Toshio; Matsuo, Jiro; Takaoka, Gikan H; Yamada, Isao

  AIP Conference Proceedings,576, pp. 1003-1006, 2001, Peer-reviewed

  
• Ar Cluster Ion Bombardment Effects on Semiconductor Surfaces

  Seki, Toshio; Tsumura, Takaaki; Aoki, Takaaki; Matsuo, Jiro; Takaoka, Gikan H; Yamada, Isao

  Mat. Res. Soc. Symp. Proceedings,647, pp. O9.4.1-O9.4.6, 2001, Peer-reviewed

  
• Improvement and Applications of Gas Cluster Ion Beam

  KINPARA Hiromichi; SEKI Toshio; MATSUO Jiro; TAKAOKA Gikan

  Technical report of IEICE. SDM, 14 Dec. 2000

  
• Molecular Dynamics Simulation of Fluorine Ion Etching of Silicon

  CHIBA Shun-ichi; AOKI Takaaki; MATSUO Jiro; TAKAOKA Gikan

  Technical report of IEICE. SDM, 14 Dec. 2000

  
• Si(111)上Ge極薄膜へのイオン照射効果

  瀬木 利夫; 津村 一道; 松尾 二郎; 高岡 義寛

  Proceedings of the 11th Symposium on Beam Engineering of Advanced Material Syntheses,, pp. 41-44, Nov. 2000

  
• Novel analysis techniques using cluster ion beams

  J Matsuo; N Toyoda; M Saito; T Aoki; T Seki; Yamada, I

  APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, Peer-reviewed

  
• Cluster size measurement of large Ar cluster ions with Time of Flight

  Noriaki Toyoda; Masahiro Saito; Norihisa Hagiwara; Jiro Matsuo; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• Development of multi-beam gas cluster ion beam equipment for high quality ITO film formation at low temperatures

  E. Minami; W. Qin; M. Akizuki; H. Kastumata; J. Matsuo; I. Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• Boron diffusion in ultra low-energy (<1 keV/atom) decaborane (B₁₀H₁₄) ion implantation

  Takuya Kusaba; Norihiro Shimada; Takaaki Aoki; Jiro Matsuo; Isao Yamada; Kenichi Goto; Toshihiro Sugii

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• Fullerene ion (C₆₀⁺) implantation in GaAs(100) substrate

  Takashi Nishihara; Hiroshi Katsumata; Jiro Matsuo; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• Formation of oxide thin films for optical applications by O₂-cluster ion beam assisted deposition

  H. Katsumata; J. Matsuo; T. Nishihara; T. Tachibana; E. Minami; K. Yamada; M. Adachi; I. Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• Computer simulation of decaborane implantation and rapid thermal annealing

  Zinetulla Insepov; Takaaki Aoki; Jiro Matsuo; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• Formation of shallow junctions using decaborane molecular ion implantation; Comparison with molecular dynamics simulation

  Majeed A. Foad; Roger Webb; Roger Smith; Erin Jones; Amir Al-Bayati; Mark Lee; Vikas Agrawal; Sanjay Banerjee; Jiro Matsuo; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• STM observations of the annealing process of the damage caused by ion impact

  Toshio Seki; Jiro Matsuo; Isao Yamada

  Proceedings of the International Conference on Ion Implantation Technology, 1999, Peer-reviewed

  
• VT-STM observation of Si surfaces damaged by ion impact

  SEKI Toshio; MATSUO Jiro; YAMADA Isao

  Technical report of IEICE. SDM, 10 Dec. 1998

  
• Damage formation and enhanced diffusion by decaborane ion implantation

  KUSABA T.; SEKI T.; AOKI T.; MATSUO J.; KASE M.; GOTO K.; SUGII T.; YAMADA I.

  Technical report of IEICE. SDM, 10 Dec. 1998

  
• Cluster Ion Implantation and Device Processes

  Isao Yamada; Jiro Matsuo; Noriaki Toyoda; Takaaki Aoki

  Shinku/Journal of the Vacuum Society of Japan, 1998

  
• High quality oxide film formation by O-2 cluster ion assisted deposition technique

  J Matsuo; W Qin; M Akizuki; T Yodoshi; Yamada, I

  ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 1998, Peer-reviewed

  
• Channel engineering using B₁₀H₁₄ ion implantation for low Vth and high SCE immunity of buried-channel PMOSFETs in 4-Gbit DRAMs and beyond

  T. Tanaka; H. Ogawa; K. Goto; K. Itabashi; T. Yamazaki; J. Matsuo; T. Sugii; I. Yamada

  Digest of Technical Papers - Symposium on VLSI Technology, 1998, Peer-reviewed

  
• Computer simulation of annealing after cluster ion implantation

  Z Insepov; T Aoki; J Matsuo; Yamada, I

  SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 1998, Peer-reviewed

  
• Ultra shallow junction formation by cluster ion implantation

  J Matsuo; T Aoki; K Goto; T Sugii; Yamada, I

  SILICON FRONT-END TECHNOLOGY-MATERIALS PROCESSING AND MODELLING, 1998, Peer-reviewed

  
• Size dependence of bombardment characteristics produced by cluster ion beams

  T Seki; M Tanomura; T Aoki; J Matsuo; Yamada, I

  ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 1998, Peer-reviewed

  
• Molecular dynamics simulation of fullerene cluster ion impact

  T Aoki; T Seki; M Tanomura; J Matsuo; Z Insepov; Yamada, I

  ATOMISTIC MECHANISMS IN BEAM SYNTHESIS AND IRRADIATION OF MATERIALS, 1998, Peer-reviewed

  
• A New Sputter Etching Technology by Gas-Cluster Ion Beam

  YAMADA Isao; MATSUO Jiro; TOYODA Noriaki; AOKI Takaaki; INSEPOV Zinetulla

  Journal of the Surface Science Society of Japan, 10 Dec. 1997

  
• Gas Cluster Ion Beam Processing

  YAMADA Isao; MATSUO Jiro; TOYODA Noriaki; AOKI Takaaki

  電気学会研究会資料. MC, 金属・セラミックス研究会, 18 Nov. 1997

  
• クラスタ-衝突における非線形効果 (原子核とマイクロクラスタ-の類似性と異質性)

  瀬木 利夫; 田能村 昌宏; 松尾 二郎; 山田 公

  物性研究, May 1997

  
• Surface processing by gas cluster ion beams

  N Toyoda; J Matsuo; Yamada, I

  ION IMPLANTATION TECHNOLOGY - 96, 1997, Peer-reviewed

  
• Range and damage distribution in cluster ion implantation

  Yamada, I; J Matsuo; EC Jones; D Takeuchi; T Aoki; K Goto; T Sugii

  MATERIALS MODIFICATION AND SYNTHESIS BY ION BEAM PROCESSING, 1997, Peer-reviewed

  
• Cluster ion implantation for shallow junction formation

  J Matsuo; D Takeuchi; T Aoki; Yamada, I

  ION IMPLANTATION TECHNOLOGY - 96, 1997, Peer-reviewed

  
• The Molecular Dynamics Simulation of Boron Cluster Ion Implantation

  AOKI T; SHIMADA N; TAKEUCHI D; MATSUO J; INSEPOV Z; YAMADA I

  Technical report of IEICE. SDM, 06 Dec. 1996

  
• Nanoscale processing by gas cluster ion beams - Novel technique in ion beam processing

  Yamada, I; J Matsuo

  THIRD INTERNATIONAL CONFERENCE ON INTELLIGENT MATERIALS - THIRD EUROPEAN CONFERENCE ON SMART STRUCTURES AND MATERIALS, 1996, Peer-reviewed

  
• Lateral sputtering by gas cluster ion beams and its applications to atomic level surface modification

  Yamada, I; J Matsuo

  ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 1996, Peer-reviewed

  
• Bombarding effects of gas cluster ion beams on sapphire surfaces: Characteristics of modified layers and their mechanical and optical properties

  D Takeuchi; J Matsuo; Yamada, I

  ION-SOLID INTERACTIONS FOR MATERIALS MODIFICATION AND PROCESSING, 1996, Peer-reviewed

  
• Molecular beam study of semiconductor surface reactions -Reaction mechanism of chlorine on silicon surfaces-

  MATSUO Jiro; KARAHASHI Kazuhiro

  應用物理, 10 Nov. 1993

  
• REACTION-KINETICS OF ATOMIC CHLORINE ON SI(100)2X1

  K KARAHASHI; J MATSUO; K HORIUCHI

  EVOLUTION OF SURFACE AND THIN FILM MICROSTRUCTURE, 1993, Peer-reviewed

  

Books and Other Publications

• Ultra-Hard DLC formation at low temperture by gas cluster in beam assisted deposition

  松尾 二郎

  Mass and Change transprt in inorganic matcrials,/,957-964, 2000, Not refereed

  
• Clustor size Measurment of Large Ar Cluster Ins with Time of Flight

  松尾 二郎

  IEEE, Proc. of the 12th International Canferencecn Im Implantation Technology,/,1234-1237, 1999, Not refereed

  
• AIP, Application of Cluster In Implantation Micro electronic Devices

  松尾 二郎

  AIP, Application of Accelaratars in Research and Industry,/,379-382, 1999, Not refereed

  
• Borm Diffusiun in Ultra Low Enery Decaboranc Im Implantation

  松尾 二郎

  IEEE, Proc, of the 12th International Canferencecn Im Implantation Technology,/,1258-1261, 1999, Not refereed

  
• Monte Curlo Simolation of Surfaces Smoothing Effect by Closter Ions

  松尾 二郎

  IEEE, Proc. of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1230-1233, 1999, Not refereed

  
• Development of Multi Been Gas Cluster In Bean Egipment for High Quality ITO Film Formation at Low temperatune

  松尾 二郎

  IEEE, Proc, of the 12th In fornatinal Canferecnce on Im Inplantation Technology,/,1191-1194, 1999, Not refereed

  
• Formation of Complex Cluster in Ar/O₂ Gas Closter Beams

  松尾 二郎

  IEEE, Proc, of the 12th International Conferencecn Im Implantation Technology,/,1226-1229, 1999, Not refereed

  
• STM-Observatins of the Amealiy Process of the Damage Caosel by Im Impact

  松尾 二郎

  IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1262-1265, 1999, Not refereed

  
• Formation of oxide thir Films for Optical Applications by Oz cluster Im Assited Depusitim

  松尾 二郎

  IEEE, Proc. of the 12th International Conferercecn Im Inplantation Technology,/,1195-1198, 1999, Not refereed

  
• Moleculen Dynamic Study of Inplat and Damge Furmation in Low Energy Borm Cluster Im Implantation

  松尾 二郎

  IEEE, Proc, of the 12th Internatinal Canference on Im Implantation Technology,/,1254-1257, 1999, Not refereed

  
• Surface Smoothing of CVD Diamond Membrane for X-ray Lithography by Gcs Cluster In Beam

  松尾 二郎

  RIP, Application of Accelarutors in Research and Industry,/,421-424, 1999, Not refereed

  
• Novel Analysis Technigue using Gas Closter Becns

  松尾 二郎

  AIP, Applicatin of Accelertirs in Research and Industry,/,429-432, 1999, Not refereed

  
• Optical Thin Film Formation by Gas Closter In Becn Assisted Depositin

  松尾 二郎

  AIP, Application of Accelertors in Research and Industry,/,409-412, 1999, Not refereed

  
• Fulleren Im Implantation in GaAs(100)substrate

  松尾 二郎

  IEEE, Proc, of the 12th Infornatinal Canferecnce on Im Implantation Technology,/,1203-1206, 1999, Not refereed

  
• Oxide Film Deposition by Gas Cluster Im Assisted Depusitin

  松尾 二郎

  AIP, Application of Acceleratons in Research and Industry,/,425-428, 1999, Not refereed

  
• Cluster Ion Beam Processing

  松尾 二郎

  Materials Science in Semiconductor Procesing,/,27-41, 1998, Not refereed

  
• "Range and Damage Distribution in Cluster Ion Implantation"

  松尾 二郎

  Materials Research Society Symposium Proceedings,438/,363-374, 1997, Not refereed

  
• "Fundamental Aspects of the Ionized Cluster-Beam Deposition Process"

  松尾 二郎

  Surface Review and Letters,3/1,1013-1016, 1996, Not refereed

  
• "Surface Processing by Gas Cluster Ion Beams"

  松尾 二郎

  International Conference on Ion Implantation Technology, IIT'96,, 1996, Not refereed

  
• "Shallow Junction Formation by Polyatomic Cluster Ion Implantation"

  松尾 二郎

  International Conference on Ion Implantation Technology, IIT'96,, 1996, Not refereed

  
• "Gas-Cluster Ion Collisions on Solid Surfaces"

  松尾 二郎

  Proceedings of the International Symposium on Material Chemistry in Nuclear Enviroment,/,517-525, 1996, Not refereed

  
• "Shallow Junction Formation by Polyatomic Cluster Ion Implantation"

  松尾 二郎

  IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,772-775, 1996, Not refereed

  
• "Cluster Ion Implantation for Shallow Junction Formation"

  松尾 二郎

  International Conference on Ion Implantation Technology, IIT'96,, 1996, Not refereed

  
• "Bombarding Effects of Gas Cluster Ion Beams on Sapphire Surfaces : Characteristics of Modified Layers and Their Mechanical and Optical Properties"

  松尾 二郎

  Materials Research Society Symposium Proceedings,396/,279-284, 1996, Not refereed

  
• "Low-Damage Surface Treatment by Gas Cluster-Ion Beams"

  松尾 二郎

  Surface Review and Letters,3/1,891-895, 1996, Not refereed

  
• "Sputtering with Gas Cluster-Ion Beams"

  松尾 二郎

  Surface Review and Letters,3/1,1017-1021, 1996, Not refereed

  
• "Lateral Sputtering by Gas Cluster Ion Beams and Its Applications to Atomic Level Surface Modification"

  松尾 二郎

  Materials Research Society Symposium Proceedings,396/,149-154, 1996, Not refereed

  
• "Cluster Ion Bombardment-Induced Surface Damage of Si"

  松尾 二郎

  Surface Review and Letters,3/1,1045-1049, 1996, Not refereed

  
• "Gas Cluster Ion Beam Processing for ULSI Fabrication"

  松尾 二郎

  Material Research Society Symposium Proceedings,427/,265-276, 1996, Not refereed

  
• "Novel Shallow Junction Technology Using Decaborane(B10H14)"

  松尾 二郎

  Proceedings of IEDM,, 1996, Not refereed

  
• "Cluster Ion Implantation for Shallow Junction Formation"

  松尾 二郎

  IEEE Proceedings of the 11th INT'L Conference on Ion Implantation Technology,1/,768-771, 1996, Not refereed

  
• "Nanoscale Processing by Gas Cluster Ion Beams-Novel Technique in Ion Beam Processing-"

  松尾 二郎

  Proceedings of the 3rd International Conference on Intelligent Materials,, 1996, Not refereed

  
• "Cluster Ion Beam Processing of Materials"

  松尾 二郎

  Ion Implantation Technology-IIT'94, (Elsevier Science B. V. ),/,1002-1005, 1995, Not refereed

  
• "Improvement of Diamond X-Ray Mask Membrane : Optical Transmittance, Surface Roughness and Irradiation Durability"

  松尾 二郎

  Proceedings of Micro-and Nano-Engineering '95,/,1-5, 1995, Not refereed

  

Works

• クラスターイオンビームプロセスの研究

  From 2000

  

Awards

• 23 Sep. 2018

  日本応用物理学会, 日本応用物理学会フェロー

External funds: Kakenhi

• Ambient SIMS Technique for Liquid-Solid Interface Analysis

  Grant-in-Aid for Scientific Research (A)

  Kyoto University

  Jiro MATSUO

  From 01 Apr. 2017, To 31 Mar. 2021, Project Closed

  固液;2次イオン;高速重イオン;クラスター;大気圧SIMS法;SIMS;イオン;表面分析;固液界面;二次イオン;大気圧分析;質量分析

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-17H01058/
• Development of direct visualization methods of steroid hormones on tissue sections by imaging mass spectrometry..

  Grant-in-Aid for Challenging Exploratory Research

  Nara Medical University

  Osamu Hatano

  From 01 Apr. 2014, To 31 Mar. 2017, Project Closed

  ステロイドホルモン;質量分析イメージング;副腎皮質;On-Tissue 誘導体化;SALDI;Nano-PALDI;誘導体化試薬;On Tissue 誘導体化;副腎;質量分析;MALDI;nano-PALDI;イオン化;ナノ粒子

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-26670461/
• Development of analytical technique for organic materials with massive cluster ion beams

  Grant-in-Aid for Scientific Research (A)

  Kyoto University

  Jiro MATSUO

  From 01 Apr. 2011, To 31 Mar. 2014, Project Closed

  SIMS;クラスターイオン;分析;バイオ;高分子;クラスター;イオン;二次イオン

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-23246012/
• Development of femto-second X-ray source

  Grant-in-Aid for Challenging Exploratory Research

  Kyoto University

  Jiro MATSUO

  From 01 Apr. 2010, To 31 Mar. 2012, Project Closed

  フェムト秒;X線回折;相転移;レーザー;結晶

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-22656008/
• PRECISE MEASUREMENTS OF SECONDARY ELECTRONS AND IONS PRODUCED IN COLLISIONS BETWEEN FAST PROJECTILE IONS AND LIQUID MOLECULAR JET TARGETS

  Grant-in-Aid for Scientific Research (B)

  KYOTO UNIVERSITY

  Akio ITOH

  From 01 Apr. 2004, To 31 Mar. 2007, Project Closed

  液体分子線;二次イオン;二次電子;イオン照射;生体細胞;放射線応答;エネルギー損失;非弾性衝突;液体ジェット;高速イオン衝突;エネルギ阻止能;ブラッグピーク;生体高分子;平均自由行程, LIQUID MOLECULAR BEAM;SECONDARY ION;SEDONCDARY ELECTRON;ION IRRADIATION;BIOMOLECULE;RADIATION RESPONSE;ENERGY LOSS;STOPPING POWER

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-16360474/
• Study of Cluster Ion Analysis method?

  Grant-in-Aid for Scientific Research (C)

  KYOTO UNIVERSITY

  Jiro MATSUO

  From 01 Apr. 2002, To 31 Mar. 2004, Project Closed

  クラスター;SIMS;分析;2次イオン;非線形;半導体;イオンビーム;多体衝突, ion;cluster;secondary ion;SIMS;simulation;many-body collision;oxygen;sputtering

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-14550025/
• Study on high quality oxide formation

  Grant-in-Aid for Scientific Research (C)

  KYOTO UNIVERSITY

  Jiro MATSUO

  From 01 Apr. 2000, To 31 Mar. 2002, Project Closed

  イオン;クラスター;酸化;酸化物;シミュレーション;多体衝突;薄膜;機能性薄膜;酸化膜;酸素クラスター;多体衝突効果;高密度照射効果;薄膜形成;酸化物薄膜, ion;cluster;oxidation;oxide;simulation;many-body collision;thin film

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-12650697/
• A STUDY ON ULTRA-HARD FILM FORMATION BY MACROPARTICLE ION BEAM WITH HIGH ENERGY

  Grant-in-Aid for Scientific Research (B).

  KYOTO UNIVERSITY

  Gikan TAKOKA

  From 01 Apr. 1998, To 31 Mar. 2001, Project Closed

  多原子イオンビーム;フラーレン;アルゴンクラスター;多体衝突効果;高密度照射効果;薄膜形成;炭素薄膜;クラスター;イオンビーム;Arクラスター;非線形照射効果;ビッカース硬度, macroparticle;fullerene;Argon cluster;multicollisions;high density irradiation;film formation;carbon film

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-10450119/
• Nonlinear Phenomena in Cluster Ion impact on Solid Surfaces

  Grant-in-Aid for Scientific Research (A)

  KYOTO UNIVERSITY

  Isao YAMADA

  From 01 Apr. 1997, To 31 Mar. 2000, Project Closed

  クラスターイオン;2次イオン;非線形;アルゴンクラスター;イオン注入;分子動力学;SIMS;浅い接合;フラーレン;ホウ素クラスター;損傷形成;TOF;多価イオン;スパッタリング;多体衝突;質量分析, cluster ion;secondary ion;non-linear;Ar cluster;ion implantation;molecular dynamics;SIMS;shallow junction

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09305004/
• ガスクラスターイオンビームと固体表面との反応素過程に関する研究

  Grant-in-Aid for Scientific Research on Priority Areas

  Kyoto University

  山田 公

  From 01 Apr. 1997, To 31 Mar. 1998, Project Closed

  クラスターイオン;表面反応;エッチング;スパッタリング;反応生成物;質量分析;化学スパッタリング

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09216214/
• Material Processing with Cluster Ion Beams

  Grant-in-Aid for international Scientific Research

  KYOTO UNIVERSITY

  Isao YAMADA

  From 01 Apr. 1997, To 31 Mar. 1999, Project Closed

  クラスターイオン;透過電子顕微鏡;増速拡散;多体衝突;STM;励起反応;格子間原子, cluster ion;TEM;enhaned reaction;multiple collision;STM;induced reaction;interstitial

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09044157/
• SURFACE MODIFICATION BY HIGH INTENSITY ION BEAM IRRADIATION

  Grant-in-Aid for Scientific Research (C)

  KYOTO UNIVERSITY

  Jiro MATSUO

  From 01 Apr. 1996, To 31 Mar. 1998, Project Closed

  クラスターイオン;酸化反応;エッチング;スパッタリング;SiC;薄膜形成;InO_x;導電性透明薄膜;InOx, CLUSTER ION;OXIDIZATION;ETCHING;SPUTTERING;SiC;FILM FORMATION;InOx;TRANSPARENT CONDUCTING FILM

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08650843/
• ガスクラスターイオンビームと固体表面との反応素過程に関する研究

  Grant-in-Aid for Scientific Research on Priority Areas

  Kyoto University

  山田 公

  From 01 Apr. 1996, To 31 Mar. 1997, Project Closed

  クラスターイオン;表面反応;エッチング;スパッタリング;反応生成物;質量分析;化学スパッタリング

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08230222/
• ガスクラスターイオンビームと固体表面との反応素過程に関する研究

  Grant-in-Aid for Scientific Research on Priority Areas

  Kyoto University

  山田 公

  From 01 Apr. 1995, To 31 Mar. 1996, Project Closed

  クラスターイオン;表面反応;エッチング;スパッタリング;非線形

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07240222/
• Study on development of cluster ion implantation system for LSI

  Grant-in-Aid for Developmental Scientific Research (B)

  KYOTO UNIVERSITY

  Isao YAMADA

  From 01 Apr. 1992, To 31 Mar. 1995, Project Closed

  ガスクラスター;高密度照射効果;低エネルギーイオンビーム;ラテラルスパッタ;イオン注入;表面クリーニング;薄膜形成;LSI;イオンビーム;クラスターイオン;ラテラルスパッタ効果;多体衝突効果;クラスターイオン注入;クラスターイオンビーム技術;ラバルノズル;フリージェットノズル;スパッタ;高密度照射;極浅接合形成, gas cluster;high density irradiation effect;low energy ion beam;lateral sputtering;ion implantation;surface cleaning;film formation;LSI

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-04555003/
• Study on epitaxial metal/insulator multilayr structure formation

  Grant-in-Aid for General Scientific Research (B)

  KYOTO UNIVERSITY

  Isao YAMADA

  From 01 Apr. 1992, To 31 Mar. 1995, Project Closed

  ICB;エピタキシャル成長;真空一貫プロセス;A1;A1_2O_3積層構造;量子効果デバイス;共鳴トンネルデバイス;トンネル電流;Al;Al_2O_3積層構造;エピタキシー;積層構造;共鳴トンネルダイオード;超薄膜;低温成長;ICB法;反応性ICB法;走査トンネル顕微鏡;トンネルデバイス, ICB;epitaxial growth;on-line vacuum process;Al;Al_2O_3 multilayr structure;quantum effect device;resonant tunnel device;tunnel current

  https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-04452202/

External funds: others

• Collision Dynamics of Hyper-thormal Particles on Solid Surfaces
• Study on Cluster Ion Beam Processing
• ソフトナノマテリアル３Ｄ分子イメージン グ法の開発

  独立行政法人科学技術振興機構理事長　北澤宏一
• クラスターイオンを用いる固液界面評価技術の開

  研究成果展開事業（先端計測分析技術・機器開発プログラム）

  From 01 Dec. 2014, To 30 Mar. 2018

  松尾二郎

Education

Teaching subject(s)

• From 01 Apr. 2024, To 31 Mar. 2025

  Introduction to Solid State Physics

  5148, Fall, Faculty of Engineering, 2
• From 01 Apr. 2024, To 31 Mar. 2025

  Quantum Science

  C074, Fall, Graduate School of Engineering, 2
• From 01 Apr. 2024, To 31 Mar. 2025

  Quantum Beam Science, Adv.

  R001, Spring, Graduate School of Engineering, 2
• From 01 Apr. 2024, To 31 Mar. 2025

  Advanced Course of Electromagnetism

  N233, Spring, Institute for Liberal Arts and Sciences, 2
• From 01 Apr. 2023, To 31 Mar. 2024

  Introduction to Solid State Physics

  5148, Fall, Faculty of Engineering, 2
• From 01 Apr. 2023, To 31 Mar. 2024

  Quantum Science

  C074, Fall, Graduate School of Engineering, 2
• From 01 Apr. 2023, To 31 Mar. 2024

  Quantum Beam Science, Adv.

  R001, Spring, Graduate School of Engineering, 2
• From 01 Apr. 2023, To 31 Mar. 2024

  Advanced Course of Electromagnetism

  N233, Spring, Institute for Liberal Arts and Sciences, 2
• From 01 Apr. 2022, To 31 Mar. 2023

  Advanced Course of Electromagnetism

  N233, Spring, Institute for Liberal Arts and Sciences, 2
• From 01 Apr. 2022, To 31 Mar. 2023

  Quantum Science

  C074, Fall, Graduate School of Engineering, 2
• From 01 Apr. 2022, To 31 Mar. 2023

  Introduction to Solid State Physics

  5148, Fall, Faculty of Engineering, 2
• From 01 Apr. 2022, To 31 Mar. 2023

  Engineering Internship M

  C050, Fall, Graduate School of Engineering, 2
• From 01 Apr. 2022, To 31 Mar. 2023

  Quantum Beam Science, Adv.

  R001, Spring, Graduate School of Engineering, 2
• From 01 Apr. 2022, To 31 Mar. 2023

  Engineering Internship D

  R017, Fall, Graduate School of Engineering, 2
• From Apr. 2011, To Mar. 2012

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2011, To Mar. 2012

  量子科学

  Fall, 工学研究科
• From Apr. 2011, To Mar. 2012

  量子物性基礎論（原）

  Fall, 工学部
• From Apr. 2011, To Mar. 2012

  原子物理学（材エネ原宇）

  Fall, 工学部
• From Apr. 2012, To Mar. 2013

  Atomic Physics

  Fall, 工学部
• From Apr. 2012, To Mar. 2013

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2012, To Mar. 2013

  Quantum Science

  Fall, 工学研究科
• From Apr. 2012, To Mar. 2013

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2013, To Mar. 2014

  Atomic Physics

  Fall, 工学部
• From Apr. 2013, To Mar. 2014

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2013, To Mar. 2014

  Quantum Science

  Fall, 工学研究科
• From Apr. 2013, To Mar. 2014

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2014, To Mar. 2015

  Atomic Physics

  Fall, 工学部
• From Apr. 2014, To Mar. 2015

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2014, To Mar. 2015

  Quantum Science

  Fall, 工学研究科
• From Apr. 2014, To Mar. 2015

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2015, To Mar. 2016

  Atomic Physics

  Fall, 工学部
• From Apr. 2015, To Mar. 2016

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2015, To Mar. 2016

  Quantum Science

  Fall, 工学研究科
• From Apr. 2015, To Mar. 2016

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2016, To Mar. 2017

  Advanced Science

  Fall, 総合生存学館
• From Apr. 2016, To Mar. 2017

  Atomic Physics

  Fall, 工学部
• From Apr. 2016, To Mar. 2017

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2016, To Mar. 2017

  Quantum Science

  Fall, 工学研究科
• From Apr. 2016, To Mar. 2017

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2017, To Mar. 2018

  Advanced Science

  Fall, 総合生存学館
• From Apr. 2017, To Mar. 2018

  Atomic Physics

  Fall, 工学部
• From Apr. 2017, To Mar. 2018

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2017, To Mar. 2018

  Quantum Science

  Fall, 工学研究科
• From Apr. 2017, To Mar. 2018

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2018, To Mar. 2019

  Atomic Physics

  Fall, 工学部
• From Apr. 2018, To Mar. 2019

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2018, To Mar. 2019

  Quantum Science

  Fall, 工学研究科
• From Apr. 2018, To Mar. 2019

  Quantum Beam Science, Adv.

  Spring, 工学研究科
• From Apr. 2018, To Mar. 2019

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2019, To Mar. 2020

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2019, To Mar. 2020

  Quantum Science

  Fall, 工学研究科
• From Apr. 2019, To Mar. 2020

  Quantum Beam Science, Adv.

  Spring, 工学研究科
• From Apr. 2019, To Mar. 2020

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2020, To Mar. 2021

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2020, To Mar. 2021

  Quantum Science

  Fall, 工学研究科
• From Apr. 2020, To Mar. 2021

  Quantum Beam Science, Adv.

  Spring, 工学研究科
• From Apr. 2020, To Mar. 2021

  Advanced Course of Electromagnetism

  Spring, 全学共通科目
• From Apr. 2021, To Mar. 2022

  Internship

  Fall, 工学部
• From Apr. 2021, To Mar. 2022

  Engineering Internship D

  Fall, 工学研究科
• From Apr. 2021, To Mar. 2022

  Engineering Internship M

  Fall, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering A, B

  Spring, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering A, B

  Fall, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering, Adv. A

  Spring, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering, Adv. B

  Fall, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering, Adv. C

  Spring, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering, Adv. D

  Fall, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering, Adv. E

  Spring, 工学研究科
• From Apr. 2021, To Mar. 2022

  Seminar on Nuclear Engineering, Adv. F

  Fall, 工学研究科
• From Apr. 2021, To Mar. 2022

  Experiments and Exercises on Nuclear Engineering, Adv.I

  Year-long, 工学研究科
• From Apr. 2021, To Mar. 2022

  Experiments and Exercises on Nuclear Engineering, Adv.II

  Year-long, 工学研究科
• From Apr. 2021, To Mar. 2022

  English for Engineering Science

  Spring, 工学部
• From Apr. 2021, To Mar. 2022

  Graduation Thesis2

  Fall, 工学部
• From Apr. 2021, To Mar. 2022

  Graduation Thesis1

  Spring, 工学部
• From Apr. 2021, To Mar. 2022

  Graduation Thesis1

  Fall, 工学部
• From Apr. 2021, To Mar. 2022

  Graduation Thesis2

  Spring, 工学部
• From Apr. 2021, To Mar. 2022

  Master's Thesis

  Year-long, 工学研究科
• From Apr. 2021, To Mar. 2022

  Introduction to Solid State Physics

  Fall, 工学部
• From Apr. 2021, To Mar. 2022

  Quantum Science

  Fall, 工学研究科
• From Apr. 2021, To Mar. 2022

  Quantum Beam Science, Adv.

  Spring, 工学研究科
• From Apr. 2021, To Mar. 2022

  Advanced Course of Electromagnetism

  Spring, 全学共通科目

Participation in PhD Defense

• 高速クラスター粒子の配向と構造が二次イオン放出に及ぼす効果に関する研究

  MURASE RYU, Graduate School of Engineering, Sub-chief Examiner

  23 Mar. 2022

Part-time lecturer

• From 11 Apr. 2013, To 31 Mar. 2014

  名古屋大学, 大学院生命農学研究科
• From 09 Apr. 2015, To 31 Mar. 2016

  国立大学法人大阪大学

Administration

Faculty management (title, position)

• From 01 Apr. 2018, To 31 Mar. 2019

  工学研究科・工学部図書委員会　委員
• From 01 Apr. 2019, To 31 Mar. 2020

  宇治キャンパス公開２０１９実行委員会委員
• From 01 Apr. 2019, To 31 Mar. 2021

  宇治地区総合環境安全管理センター運営委員会委員