The Mining and Materials Processing Institute of Japan
From Jan. 1998, To Present
The Surface Finishing Society of Japan
From Jun. 1998, To Present
The Electrochemical Society of Japan
From Feb. 2017, To Present
THE JAPAN INSTITUTE OF METALS AND MATERIALS
From 1992, To Present
The Chemical Society of Japan
From Oct. 2005, To Present
International Society of Electrochemistry
From 2000, To Present
The Electrochemical Society
From Nov. 1997, To Present
The Minerals, Metals & Materials Society
From 2004, To Present
Ionic Liquid Research Association
From 2011, To Present
Electroplater's Technical Association
From 1992, To Present
The Rare Earth Society of Japan
From 2002, To Present
DGCbase
Academic Degree
Master of Engineering(Osaka University)
Doctor of Engineering(Osaka University)
Academic Resume (Graduate Schools)
Osaka University, Faculty of Engineering, Department of Applied Chemistry, 修了
Osaka University, Faculty of Engineering, Department of Applied Chemistry, 修了
Academic Resume (Undergraduate School/Majors)
Osaka University, Faculty of Engineering, Department of Applied Chemistry, 卒業
Research History
From 2024
Nagoya Institute of Technology, 非常勤講師
From Jan. 2012, To Present
Kyoto University, 工学研究科材料工学専攻, 教授
From 2020
Nagasaki University, Graduate School of Engineering, 非常勤講師
From 2019
Toyohashi University of Technology, 非常勤講師
From 2017
Toyohashi University of Technology, 非常勤講師
From 2016
Osaka University, 工学研究科, 非常勤講師
From 2016
Doshisha University, 工学部, 非常勤講師
From 2015
Toyohashi University of Technology, 非常勤講師
From 2013
Toyohashi University of Technology, 非常勤講師
From Apr. 2007, To Dec. 2011
Kyoto University, 工学研究科材料工学専攻, 准教授
From Nov. 2004, To Mar. 2007
Kyoto University, 工学研究科材料工学専攻, 助教授
From Jul. 1996, To Oct. 2004
Kyoto University, 工学研究科材料工学専攻, 助手
From Apr. 1996, To Jun. 1996
日本学術振興会特別研究員PD(大阪大学)
From Apr. 1993, To Mar. 1996
日本学術振興会特別研究員DC1(大阪大学)
Profile
Profile
Kuniaki MURASE was born in Osaka, Japan, in 1967. He received the B.E. degree in applied chemistry in 1991, and PhD degree in engineering in 1996 from Osaka University. The title of the PhD thesis is "Studies on Rare Earth Separation Using Chemical Vapor Transport”. From 1993 to 1996, he was the Research Fellow of the Japan Society for the Promotion of Science (JSPS). In 1996 he joined the Department of Materials Science and Engineering, Kyoto University, as a Research Associate, and became an Associate Professor in 2004 and a full Professor in 2012. His current research interests include electrochemical/chemical processing of metals, alloys, and compounds for surface finishing, thin-layer formation, and hydrometallurgy using aqueous, non-aqueous, or ionic-liquid media. He has written more than 150 peer-reviewed scientific papers. He is an active member of The Electrochemical Society (ECS), The International Society of Electrochemistry (ISE), and The Minerals, Metals and Materials Society (TMS). He was the recipient of the Young Scientist Awards of The Surface Finishing Society of Japan (SFJ) in 2001 and of The Mining and Materials Processing Institute of Japan (MMIJ) in 2007, in recognition of his outstanding research work in the aqueous electrodeposition and chemical thermodynamics of alloys and compounds.
Electrochemical/chemical processing of metals, alloys, and compounds for surface finishing, thin-layer formation, and hydrometallurgy using aqueous, non-aqueous, or ionic-liquid media
Research Interests
Electroplating
Electrometallurgy
Electrodeposition
Electrochemistry
Surface Finishing
Research Areas
Nanotechnology/Materials, Material fabrication and microstructure control
Nanotechnology/Materials, Metals and resources production
Thermodynamic Study of Adsorption behaviors of Trivalent Metal Ions onto Chelating Resin: Comparison between Scandium(III) and Other Metal Ions
Hiroto WATANABE; Satoshi ASANO; Kuniaki MURASE
Journal of MMIJ, 31 May 2024, Peer-reviewed, Last author
Tin-Silver Alloy Electrodeposition from a Concentrated Calcium Chloride Aqueous Solution and Selective Recovery of Metal Components from The Electrodeposition Bath
Atsushi KITADA; Haruki KATORI; Kai ISHIKAWA; Kazuhiro FUKAMI; Kuniaki MURASE
Journal of The Surface Finishing Society of Japan, 01 Mar. 2024, Peer-reviewed, Last author
Kinetics Study of Adsorption Behaviors of Trivalent Metal Ions onto Chelating Resin: Comparison between Scandium(III) and Other Metal Ions
Hiroto Watanabe; Satoshi Asano; Kuniaki Murase
Materials Transactions, 01 Jan. 2024, Peer-reviewed, Last author
Smooth Thin Film of a CoNiCu Medium-Entropy Alloy Consisting of Single Nanometer-Sized Grains Formed by Electrodeposition in a Water-in-Oil Emulsion
Yuki Murakami; Kuniaki Murase; Kazuhiro Fukami
The Journal of Physical Chemistry C, 09 Mar. 2023, Peer-reviewed
Two-Dimensionally Grown Periodic Pores Formed by Anodization of p-Type Silicon in Concentrated NH4F Aqueous Solution: A Platform for Maskless Patterning of Metals by Electrodeposition
Takumi Yasuda; Kuniaki Murase; Kazuhiro Fukami
The Journal of Physical Chemistry C, 18 Apr. 2023, Peer-reviewed
Nanoporous boron-doped diamond produced by a combination of high-energy ion irradiation and anodization
Journal of MMIJ, 13 May 2022, Peer-reviewed, Last author
Enhancement of Oxidation of Silicon Carbide Originating from Stacking Faults Formed by Mode-Selective Phonon Excitation Using a Mid-Infrared Free Electron Laser
Yuki Maeda; Heishun Zen; Atsushi Kitada; Kuniaki Murase; Kazuhiro Fukami
The Journal of Physical Chemistry Letters, 28 Mar. 2022, Peer-reviewed
Macroscopically uniform and flat lithium thin film formed by electrodeposition using multicomponent additives
Unexpected Downstream Mode of Spatiotemporal Rotating Waves Found in the Model of H2O2 Reduction on a Platinum Ring-Shaped Electrode under Mild Convection
FEM simulation of nodulation in copper electro-refining
Adachi, K.; Nakai, Y.; Kitada, A.; Fukami, K.; Murase, K.
Minerals, Metals and Materials Series, 2018, Peer-reviewed
Experimental modeling of nodulation in copper electrorefining
Nakai, Y.; Adachi, K.; Kitada, A.; Fukami, K.; Murase, K.
Minerals, Metals and Materials Series, 2018, Peer-reviewed
Identification of copper(II)-lactate complexes in Cu2O electrodeposition baths: Deprotonation of the α-hydroxyl group in highly concentrated alkaline solution
Tianyu Chen; Atsushi Kitada; Yusuke Seki; Kazuhiro Fukami; DIlshadbek T. Usmanov; Lee Chuin Chen; Kenzo Hiraoka; Kuniaki Murase
Journal of the Electrochemical Society, 2018, Peer-reviewed
Journal of Physical Chemistry C, 24 Aug. 2017, Peer-reviewed
Redox of ferrocenylthiol SAMs in electrolytes with bis[(trifluoromethyl)sulfonyl]amide as unique anions: Parallel between aqueous and ionic liquid media
Journal of Physical Chemistry C, 27 Oct. 2016, Peer-reviewed
Accelerated growth from amorphous clusters to metallic nanoparticles observed in electrochemical deposition of platinum within nanopores of porous silicon
True Molecular-resolution Imaging on Alkanethiol Self-assembled Mono layers in Ionic Liquids by Frequency Modulation Atomic Force Microscopy Utilizing a Quartz Tuning Fork Sensor
Effect of cation species on surface-induced phase transition observed for platinum complex anions in platinum electrodeposition using nanoporous silicon
Nanotemplate Prepared by Means of Vacuum Ultraviolet Patterning of Alkylsilane Self-assembled Monolayer on ITO Using a Porous Alumina Mask: Application to the Fabrication of Gold Nanoparticle Arrays
Formation of uniform ferrocenyl-terminated monolayer covalently bonded to Si using reaction of hydrogen-terminated Si(111) surface with vinylferrocene/n-decane solution by visible-light excitation
Organosilane self-assembled multilayer formation based on activation of methyl-terminated surface with reactive oxygen species generated by vacuum ultra-violet excitation of atmospheric oxygen molecules
Gold Nanoparticle Arrays Fabricated on a Silicon Substrate Covered with a Covalently Bonded Alkyl Monolayer by Electroless Plating Combined with Scanning Probe Anodization Lithography
Self-assembled monolayers directly attached to silicon substrates formed from 1-hexadecene by thermal, ultraviolet, and visible light activation methods
Faster growth of Cu-Sn layers through reduction-diffusion method using ionic liquid bath at medium-low temperatures
Kuniaki Murase; Akira Ito; Hiroyuki Sugimura
ECS Transactions, 2008, Peer-reviewed
Surface chemical conversion of organosilane self-assembled monolayers with active oxygen species generated by vacuum ultraviolet irradiation of atmospheric oxygen molecules
Multicycle desorption-adsorption voltammetry for self-assembled mixed monolayer containing ferrocenylthiol molecules: A discussion on molecular interaction in the mixed layer
Electrochemical and Solid-State Letters, 2006, Peer-reviewed
ALTERNATING PULSED ELECTROLYSIS FOR THE FORMATION OF Fe-Cr ALLOY LAYERS WITH A COMPOSITION GRADIENT
S.Yagi; K. Murase; T. Hirato; Y. Awakura
Electrochemistry and Thermodynamics on Materials Processing for Sustainable Production:Masuko Symposium , Nov.13-15, 2006, Tokyo, Japan, 2006, Peer-reviewed
Effect of Chloride Ions on the Electrodeposition Behavior of CdTe from Ammoniacal Basic Electrolytes
Effect of Chloride; Ions on; the Electrodeposition Behavior of CdTe; from Ammoniacal; Basic Electrolytes
Hyomen Gijutsu (The Journal of the Surface Finishing Society of Japan), Jan. 2006, Peer-reviewed
Electrodeposition of Dendritic Copper on Copper or Titanium Electrode from Aqueous Copper(I) Chloride Solution Containing Condensed Sodium Halides
Electrochemical behaviour of copper in trimethyl-n-hexylammonium bis((trifluoromethyl)sulfonyl)amide, an ammonium imide-type room temperature molten salt
K Murase; K Nitta; T Hirato; Y Awakura
JOURNAL OF APPLIED ELECTROCHEMISTRY, 2001, Peer-reviewed
資源と素材 : 資源・素材学会誌 : journal of the Mining and Materials Processing Institute of Japan, Nov. 2002, Invited
2001 Joint International Meeting : The 200th Meeting of The Electrochemical Society and The 52nd Meeting of The International Society of Electrochemistry参加報告
邑瀬 邦明
資源と素材 : 資源・素材学会誌 : journal of the Mining and Materials Processing Institute of Japan, Jan. 2002, Invited
新しい分野 − 金属学 − との出会い
邑瀬邦明
金属, Dec. 2001, Invited
解説 塩基性水溶液からの電析法によるCdTe化合物半導体層の形成 (特集 ソフト溶液プロセス)
邑瀬 邦明; 粟倉 泰弘
科学と工業, Aug. 2001, Invited
Future Fabrication Techniques for Cu Wires used in si ULSI Devices
4th International Symposium on Biomimethic Materials Processing (BMMP-4), 28 Jan. 2004, 69th Committee on Materials Processing and Applications, Japan Society for the Promotion of Science (JSPS), Invited